SCHEMBL616072

SCHEMBL616072

CCOC(=O)/C(=N/O)c1ccc(SC)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
MAPT P10636 4/20 0.48
KMT2A Q03164 4/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
LMNA P02545 3/20 0.48
NPSR1 Q6W5P4 3/20 0.48
MEN1 O00255 3/20 0.48
TSHR P16473 3/20 0.48
KDM4E B2RXH2 3/20 0.48
MAPK1 P28482 1/20 0.42
HRH2 P25021 1/20 0.42
HRH1 P35367 1/20 0.42
PLK1 P53350 1/20 0.41
POLB P06746 1/20 0.41
HSD17B10 Q99714 2/20 0.40
TAS1R3 Q7RTX0 1/20 0.40
TAS1R1 Q7RTX1 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HAO1 Q9UJM8 1/20 0.38
NPC1 O15118 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL616073 1.00 ALDH1A1 (0.48) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL2140421 0.82 ALDH1A1 (0.44) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL7622033 0.81 SMN1; SMN2 (0.50) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6157165 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL7622030 0.81 SMN1; SMN2 (0.50) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6157300 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6157641 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6158730 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6157295 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA
SCHEMBL6157171 0.81 KMT2A (0.51) ALDH1A1MAPTKMT2ASMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12461445-B2 Low reflectivity photosensitive resin composition and light-shielding layer using same DUK SAN NEOLUX CO., LTD. (KR) 2025-11-04 US disclosed
US-20230273517-A1 LOW REFLECTIVITY PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT-SHIELDING LAYER USING SAME DUK SAN NEOLUX CO., LTD. (KR) 2023-08-31 US disclosed
WO-2023101208-A1 PHOTOSENSITIVE COMPOSITION HAVING LOW SURFACE TENSION 덕산네오룩스 주식회사 2023-06-08 WO disclosed
US-20230165028-A1 QUANTUM DOT-LIGAND COMPOSITE, PHOTOSENSITIVE RESIN COMPOSITION, OPTICAL FILM, ELECTROLUMINESCENT DIODE, AND ELECTRONIC DEVICE DUK SAN NEOLUX CO., LTD. (KR) 2023-05-25 US disclosed
US-20230100943-A1 SEMICONDUCTOR NANOPARTICLE-LIGAND COMPOSITE, MANUFACTURING METHOD OF THEREOF, PHOTOSENSITIVE RESIN COMPOSITION, OPTICAL FILM, ELECTROLUMINESCENT DIODE AND ELECTRONIC DEVICE DUKSAN NEOLUX CO., LTD (KR) 2023-03-30 US disclosed
WO-2023008750-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING SAME 덕산네오룩스 주식회사 2023-02-02 WO disclosed
WO-2022260249-A1 PHOTOCURABLE COMPOSITION COMPRISING INORGANIC PARTICLES 덕산네오룩스 주식회사 2022-12-15 WO disclosed
WO-2022145685-A1 RESIN, RESIN COMPOSITION, AND DISPLAY DEVICE USING SAME 덕산네오룩스 주식회사 2022-07-07 WO disclosed
WO-2022108351-A1 SEMICONDUCTOR NANOPARTICLE-LIGAND COMPOSITE, PHOTOSENSITIVE RESIN COMPOSITION, OPTICAL FILM, ELECTRICAL LIGHT-EMITTING DIODE, AND ELECTRONIC DEVICE 덕산네오룩스 주식회사 2022-05-27 WO disclosed
WO-2022108350-A1 SEMICONDUCTOR-NANOPARTICLE-LIGAND COMPLEX, PREPARATION METHOD THEREFOR, PHOTOSENSITIVE RESIN COMPOSITION, OPTICAL FILM, ELECTROLUMINESCENT DIODE AND ELECTRONIC DEVICE 덕산네오룩스 주식회사 2022-05-27 WO disclosed
US-20120037860-A1 DYE-CONTAINING NEGATIVE CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2012-02-16 US disclosed
US-8057969-B2 Dye-containing negative curable composition, color filter and method for producing the same FUJIFILM CORPORATION (JP) 2011-11-15 US disclosed
US-7645545-B2 Colorant-containing curable composition, color filter and production method thereof FUJIFILM CORPORATION (JP) 2010-01-12 US disclosed
US-20070254240-A1 Dye-containing negative curable composition, color filter and method for producing the same FUJIFILM CORPORATION (JP) 2007-11-01 US disclosed
EP-1850178-A2 Dye-containing negative curable composition, color filter and method for producing the same FUJIFILM Corporation (JP) 2007-10-31 EP disclosed
US-20060246364-A1 Colorant-containing curable composition, color filter and production method thereof FUJI PHOTO FILM CO., LTD. 2006-11-02 US disclosed
US-6596445-B1 Initiators for photopolymerization of radically polymerizable compounds CIBA SPECIALTY CHEMICALS CORPORATION 2003-07-22 US disclosed