⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL616081 | 1.00 | — | — | |
| SCHEMBL28338620 | 0.87 | — | — | |
| SCHEMBL29576452 | 0.82 | — | — | |
| SCHEMBL9146049 | 0.82 | — | — | |
| SCHEMBL30522314 | 0.82 | — | — | |
| SCHEMBL29379185 | 0.82 | — | — | |
| SCHEMBL132029 | 0.82 | — | — | |
| SCHEMBL565229 | 0.82 | — | — | |
| SCHEMBL4953254 | 0.82 | — | — | |
| SCHEMBL152866 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5356837-A | Method of making epitaxial cobalt silicide using a thin metal underlayer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-10-18 | — | — | US | claimed |
| CN-103069097-B | Cemented carbide compositions having cobalt-silicon alloy binder | KENNAMETAL INC | 2015-05-20 | — | — | CN | disclosed |
| CN-103069097-A | Cemented carbide compositions having cobalt-silicon alloy binder | KENNAMETAL INC | 2013-04-24 | — | — | CN | disclosed |
| WO-2012021254-A1 | CEMENTED CARBIDE COMPOSITIONS HAVING COBALT-SILICON ALLOY BINDER | KENNAMETAL INC. (US) | 2012-02-16 | — | — | WO | disclosed |
| US-20120040183-A1 | Cemented Carbide Compositions Having Cobalt-Silicon Alloy Binder | KENNAMETAL, INC. (US) | 2012-02-16 | — | — | US | disclosed |
| EP-0651077-B1 | Epitaxial cobalt silicide formed using a thin metal underlayer | IBM (US) | 1998-12-23 | — | — | EP | disclosed |
| EP-0651077-A1 | Epitaxial cobalt silicide formed using a thin metal underlayer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-05-03 | — | — | EP | disclosed |
| US-5356837-A | Method of making epitaxial cobalt silicide using a thin metal underlayer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-10-18 | — | — | US | disclosed |