SCHEMBL6163945

SCHEMBL6163945

C[CH]OC(=O)CCCCCCCCCC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.57
LMNA P02545 2/20 0.53
TSHR P16473 5/20 0.53
PAM P19021 2/20 0.52
CES2 O00748 3/20 0.50
CES1 P23141 3/20 0.50
MAPT P10636 2/20 0.50
MAPK1 P28482 1/20 0.50
PPARG P37231 6/20 0.48
PPARD Q03181 6/20 0.48
PPARA Q07869 6/20 0.48
HDAC11 Q96DB2 5/20 0.48
GPR84 Q9NQS5 4/20 0.48
ALDH1A1 P00352 2/20 0.48
TLR2 O60603 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
FABP4 P15090 2/20 0.48
PTPN1 P18031 2/20 0.48
SLC22A6 Q4U2R8 1/20 0.48
SLC22A8 Q8TCC7 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5517470 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL6163541 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL698428 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL8332466 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL8896528 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL2892144 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL5508667 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL2255805 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL2254535 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2
SCHEMBL5512722 1.00 DGKA (0.57) DGKALMNATSHRPAMCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4023635-A1 ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2022-07-06 EP disclosed
US-20220146937-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-05-12 US disclosed
CN-114207526-A Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern formation method, and method for producing electronic device 富士胶片株式会社 2022-03-18 CN disclosed
WO-2021039391-A1 ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-03-04 WO disclosed
EP-1055712-B1 Aqueous ink for ink jet recording MITSUI CHEMICALS INC (JP) 2005-02-16 EP disclosed
EP-1055712-A2 Aqueous ink for ink jet recording Mitsui Chemicals, Inc. (JP) 2000-11-29 EP disclosed
WO-1999051222-A9 MACROCYCLIC POLYAMINE LACTONES AND DERIVATIVES THEREOF AND THEIR USE AS ARTHROPOD REPELLENTS CORNELL RES FOUNDATION INC (US) 1999-12-02 WO disclosed
US-5986042-A Cross-linked polymer MITSUI CHEMICALS, INC. (JP) 1999-11-16 US disclosed
EP-0856539-A1 Cross-linked polymer Mitsui Chemicals, Inc. (JP) 1998-08-05 EP disclosed
US-5686548-A POLYSILOXANES CONTAINING ANCHORING CHAINS FOR BINDING WITH A SOLID SURFACE THROUGH CHEMISORPTION RESEARCH CORPORATION TECHNOLOGIES, INC. (US) 1997-11-11 US disclosed
US-5686549-A FUNCTIONALIZED POLYSILOXANES RESEARCH CORPORATION TECHNOLOGIES, INC. (US) 1997-11-11 US disclosed
US-5670563-A ORGANOTIN COMPOUND, PHOSPHORUS COMPOUND CIBA-SPECIALTY CHEMICALS CORPORATION (US) 1997-09-23 US disclosed
EP-0335390-A2 Novel cephalosporin compounds SAGAMI CHEMICAL RESEARCH CENTER (JP) 1989-10-04 EP disclosed
US-4179435-A SULPHONIC ACID-FREE CIBA-GEIGY CORPORATION (US) 1979-12-18 US disclosed
US-4115381-A FOR POLYESTER FIBERS CIBA-GEIGY CORPORATION (US) 1978-09-19 US disclosed
US-3971771-A DYES FOR POLYESTERS CIBA-GEIGY AG (CH) 1976-07-27 US disclosed