SCHEMBL6163950

SCHEMBL6163950

[CH2]COC(=O)CCCCCCCCCC

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.69
TSHR P16473 1/20 0.63
PAM P19021 2/20 0.62
MAPT P10636 1/20 0.58
LMNA P02545 4/20 0.56
DNM1 Q05193 1/20 0.56
ALDH1A1 P00352 1/20 0.56
KDM4E B2RXH2 1/20 0.55
DUSP3 P51452 1/20 0.55
MEN1 O00255 1/20 0.55
KMT2A Q03164 1/20 0.55
PRSS1 P07477 1/20 0.53
PRSS2 P07478 1/20 0.53
PRSS3 P35030 1/20 0.53
PRKCA P17252 1/20 0.51
PRKCE Q02156 1/20 0.51
PRKCQ Q04759 1/20 0.51
PRKCD Q05655 1/20 0.51
CES2 O00748 3/20 0.50
CES1 P23141 3/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1003814 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL6166366 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL8896539 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL1001257 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL8379606 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL2892147 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL8379910 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL1003850 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL4452200 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA
SCHEMBL5597531 1.00 DGKA (0.69) DGKATSHRPAMMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109456436-B Natural gas hydrate nano accelerator and preparation method thereof 青岛科技大学 2021-01-19 CN claimed
EP-4023635-A1 ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2022-07-06 EP disclosed
US-20220146937-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-05-12 US disclosed
CN-114207526-A Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern formation method, and method for producing electronic device 富士胶片株式会社 2022-03-18 CN disclosed
WO-2021039391-A1 ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-03-04 WO disclosed
CN-109456436-B Natural gas hydrate nano accelerator and preparation method thereof 青岛科技大学 2021-01-19 CN disclosed
EP-1055712-B1 Aqueous ink for ink jet recording MITSUI CHEMICALS INC (JP) 2005-02-16 EP disclosed
EP-1055712-A2 Aqueous ink for ink jet recording Mitsui Chemicals, Inc. (JP) 2000-11-29 EP disclosed
WO-1999051222-A9 MACROCYCLIC POLYAMINE LACTONES AND DERIVATIVES THEREOF AND THEIR USE AS ARTHROPOD REPELLENTS CORNELL RES FOUNDATION INC (US) 1999-12-02 WO disclosed
US-5986042-A Cross-linked polymer MITSUI CHEMICALS, INC. (JP) 1999-11-16 US disclosed
EP-0856539-A1 Cross-linked polymer Mitsui Chemicals, Inc. (JP) 1998-08-05 EP disclosed
US-5686548-A POLYSILOXANES CONTAINING ANCHORING CHAINS FOR BINDING WITH A SOLID SURFACE THROUGH CHEMISORPTION RESEARCH CORPORATION TECHNOLOGIES, INC. (US) 1997-11-11 US disclosed
US-5686549-A FUNCTIONALIZED POLYSILOXANES RESEARCH CORPORATION TECHNOLOGIES, INC. (US) 1997-11-11 US disclosed
US-5670563-A ORGANOTIN COMPOUND, PHOSPHORUS COMPOUND CIBA-SPECIALTY CHEMICALS CORPORATION (US) 1997-09-23 US disclosed
US-5073551-A Antibiotics SAGAMI CHEMICAL RESEARCH CENTER (JP) 1991-12-17 US disclosed
EP-0335390-A2 Novel cephalosporin compounds SAGAMI CHEMICAL RESEARCH CENTER (JP) 1989-10-04 EP disclosed
US-4179435-A SULPHONIC ACID-FREE CIBA-GEIGY CORPORATION (US) 1979-12-18 US disclosed
US-4115381-A FOR POLYESTER FIBERS CIBA-GEIGY CORPORATION (US) 1978-09-19 US disclosed
US-3971771-A DYES FOR POLYESTERS CIBA-GEIGY AG (CH) 1976-07-27 US disclosed