⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL8562816 | 0.58 | — | — | |
| SCHEMBL27724999 | 0.58 | — | — | |
| SCHEMBL27987424 | 0.58 | — | — | |
| Iodine SCHEMBL5031640 | 0.41 | — | — | |
| Iodine SCHEMBL9450939 | 0.41 | — | — | |
| Water SCHEMBL21058324 | 0.41 | — | — | |
| Iodine SCHEMBL1163 | 0.41 | — | — | |
| SCHEMBL26831 | 0.33 | — | — | |
| SCHEMBL8950959 | 0.33 | — | — | |
| Iodomethane SCHEMBL384331 | 0.33 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 355 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250215565-A1 | VANADIUM CONTAINING LAYERS AND METHODS AND SYSTEMS FOR DEPOSITING SAID LAYERS | ASM IP HOLDING B.V. (NL) | 2025-07-03 | — | — | US | claimed |
| CN-119410931-A | Titanium-containing additive for aluminum alloy smelting and preparation method thereof | 沧州市东众特种合金制造有限公司 | 2025-02-11 | — | — | CN | claimed |
| CN-119392009-A | Recycling method of vanadium metal turning waste | 中色（宁夏）东方集团有限公司 | 2025-02-07 | — | — | CN | claimed |
| CN-114242986-B | Self-supporting multi-stage structure vanadium nitride-based carbon nanofiber composite material and preparation method and application thereof | 深圳大学 | 2024-09-24 | — | — | CN | claimed |
| CN-118497732-A | Magnesium alloy chromium-free phosphorus-free chemical conversion film treating agent and application thereof | 广州三孚新材料科技股份有限公司 | 2024-08-16 | — | — | CN | claimed |
| CN-116598482-A | Conversion type positive electrode material for aluminum battery, aluminum battery positive electrode, secondary aluminum battery and preparation method and application of secondary aluminum battery | 北京大学 | 2023-08-15 | — | — | CN | claimed |
| CN-114574200-A | Transition metal ion doped perovskite quantum dot material and preparation method thereof | 北京航空航天大学 | 2022-06-03 | — | — | CN | claimed |
| CN-114242986-A | Self-supporting multi-stage structure vanadium nitride-based carbon nanofiber composite material and preparation method and application thereof | 深圳大学 | 2022-03-25 | — | — | CN | claimed |
| CN-114220947-A | Lithium metal battery cathode, current collector, preparation method of current collector and battery | 厦门大学 | 2022-03-22 | — | — | CN | claimed |
| CN-112992667-A | Method of forming vanadium nitride layer and structure including vanadium nitride layer | ASM IP私人控股有限公司 | 2021-06-18 | — | — | CN | claimed |
| US-7858151-B2 | Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination | NANOSOLAR, INC. (US) | 2010-12-28 | — | — | US | claimed |
| US-7365028-B2 | Methods of forming metal oxide and semimetal oxide | MICRON TECHNOLOGY, INC. (US) | 2008-04-29 | — | — | US | claimed |
| US-20060094912-A1 | toluene and o-xylene are chlorinated in the presence of a catalyst combination produced by (1) a combination of a salt of of 4-12 metal, lanthanide, actinides; and an organic acidic counterion; (2) an organic sulfur | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2006-05-04 | — | — | US | claimed |
| US-7012166-B2 | Catalyst composition and method for chlorinating aromatic compounds | GENERAL ELECTRIC COMPANY (US) | 2006-03-14 | — | — | US | claimed |
| US-20060024881-A1 | Methods of forming metal oxide and semimetal oxide | MICRON TECHNOLOGY, INC. | 2006-02-02 | — | — | US | claimed |
| WO-2005081789-A2 | Formation of CIGS Absorber Layer by Atomic Layer Deposition | NANOSOLAR, INC. (US) | 2005-09-09 | — | — | WO | claimed |
| US-20050186342-A1 | Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination | NANOSOLAR, INC. (US) | 2005-08-25 | — | — | US | claimed |
| WO-2004082826-A2 | CATALYST COMPOSITION AND METHOD FOR CHLORINATING AROMATIC COMPOUNDS | GENERAL ELECTRIC COMPANY (US) | 2004-09-30 | — | — | WO | claimed |
| US-20040186329-A1 | Catalyst composition and method for chlorinating aromatic compounds | GENERAL ELECTRIC COMPANY | 2004-09-23 | — | — | US | claimed |
| US-4224223-A | Preparation of alkylene carbonates from olefins | ATLANTIC RICHFIELD COMPANY (US) | 1980-09-23 | — | — | US | claimed |