SCHEMBL61917

SCHEMBL61917

CN(C)c1ccc(-c2nc3ccccc3s2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 13/20 1.00
RAB9A P51151 4/20 0.63
GLA P06280 3/20 0.63
GAA P10253 3/20 0.63
KDM4E B2RXH2 3/20 0.63
NPC1 O15118 3/20 0.63
MAPT P10636 2/20 0.63
ALDH1A1 P00352 1/20 0.63
LMNA P02545 1/20 0.63
MMP9 P14780 1/20 0.63
MMP8 P22894 1/20 0.63
PAX8 Q06710 2/20 0.62
PKM P14618 1/20 0.62
SMN1; SMN2 Q16637 1/20 0.62
MEN1 O00255 1/20 0.62
KMT2A Q03164 1/20 0.62
NOD2 Q9HC29 1/20 0.62
L3MBTL1 Q9Y468 1/20 0.62
TNF P01375 1/20 0.62
NOD1 Q9Y239 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13853548 0.93 APP (0.86) APPRAB9AGLAGAAKDM4E
SCHEMBL12048769 0.87 APP (0.77) APPRAB9AGLAGAAKDM4E
SCHEMBL11224731 0.86 APP (0.76) APPRAB9AGLAGAAKDM4E
SCHEMBL24155385 0.86 APP (0.76) APPRAB9AGLAGAAKDM4E
SCHEMBL366824 0.86 RAB9A (0.81) APPRAB9AGLAGAAKDM4E
SCHEMBL29474819 0.86 RAB9A (0.81) APPRAB9AGLAGAAKDM4E
SCHEMBL10029845 0.85 APP (0.73) APPRAB9AGLAGAAKDM4E
SCHEMBL14195549 0.85 APP (0.73) APPRAB9AGLAGAAKDM4E
SCHEMBL20621544 0.84 APP (0.73) APPRAB9AGLAGAAKDM4E
SCHEMBL24295138 0.84 RAB9A (0.79) APPRAB9AGLAGAAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118725333-A Keggin type polyacid-based metal organic framework molecular material, synthesis method and application of Keggin type polyacid-based metal organic framework molecular material as photocatalyst 周口师范学院 2024-10-01 CN claimed
EP-0721336-B1 BENZAZOLE COMPOUNDS FOR USE IN THERAPY CANCER RES CAMPAIGN TECH (GB) 1999-07-14 EP claimed
EP-0721336-A1 BENZAZOLE COMPOUNDS FOR USE IN THERAPY CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) 1996-07-17 EP claimed
WO-1995006469-A1 BENZAZOLE COMPOUNDS FOR USE IN THERAPY CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) 1995-03-09 WO claimed
EP-4257623-B1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2026-05-27 EP disclosed
CN-122029488-A Photosensitive coloring composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device 三菱化学株式会社 2026-05-12 CN disclosed
US-12441842-B2 Polyimide resin, photosensitive resin composition, resin film, and electronic device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-10-14 US disclosed
CN-112313579-B Photosensitive colored resin composition, cured product, image display device, and illumination 三菱化学株式会社 2025-05-13 CN disclosed
CN-119948406-A Photosensitive colored resin composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device 三菱化学株式会社 2025-05-06 CN disclosed
WO-2025075166-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2025-04-10 WO disclosed
CN-119731226-A Block copolymer, dispersant and coloring composition 大塚化学株式会社 2025-03-28 CN disclosed
CN-119654360-A Block copolymer, dispersant and coloring composition 大塚化学株式会社 2025-03-18 CN disclosed
EP-0138187-B1 PHOTOPOLYMERIZABLE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1989-01-11 EP disclosed
EP-0291881-A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed
US-4594310-A Photopolymerizable composition comprising tertiary aromatic amine and hexaarylbiimazole initiators MITSUBISHI CHEMICAL INDUSTRIES, LTD. (JP) 1986-06-10 US disclosed
EP-0138187-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1985-04-24 EP disclosed
US-4431722-A POLYCYCLIC QUINONE PIGMENT DISPERSED IN A RESIN BINDER AS CHARGE GENERATING LAYER; ANTIFOGGING AGENTS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-02-14 US disclosed
US-4033769-A Persistent photoconductive compositions XEROX CORPORATION (US) 1977-07-05 US disclosed
US-3961954-A Acid sensitized charge transfer complexes and cyclic electrostatographic imaging XEROX CORPORATION (US) 1976-06-08 US disclosed
US-3932025-A Imaging system XEROX CORPORATION (US) 1976-01-13 US disclosed