SCHEMBL620276

SCHEMBL620276

CC(C)(CCCC(=O)O)C(C)(C)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.43
SLC22A6 Q4U2R8 2/20 0.43
TSHR P16473 5/20 0.42
NFKB1 P19838 1/20 0.42
PMP22 Q01453 1/20 0.42
AKR1B1 P15121 1/20 0.41
NAALAD2 Q9Y3Q0 1/20 0.41
GPR84 Q9NQS5 7/20 0.39
PPARG P37231 7/20 0.39
PPARD Q03181 7/20 0.39
PPARA Q07869 7/20 0.39
HDAC11 Q96DB2 5/20 0.39
PTPN1 P18031 3/20 0.39
ALDH1A1 P00352 2/20 0.39
TLR2 O60603 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
FABP4 P15090 2/20 0.39
SLC22A8 Q8TCC7 1/20 0.39
MEN1 O00255 1/20 0.39
ESR1 P03372 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28922974 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL28810323 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL31069701 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
Magnesium SCHEMBL1099913 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL1225161 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL28999590 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
Strontium SCHEMBL7268235 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL1078444 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
Strontium SCHEMBL31498316 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22
SCHEMBL27582627 0.98 LMNA (0.42) LMNASLC22A6TSHRNFKB1PMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 578 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11565936-B2 Atomic layer etching on microdevices and nanodevices THE REGENTS OF THE UNIVERSITY OF COLORADO (US) 2023-01-31 US claimed
US-20210292574-A1 PRINT-ON PASTES WITH METAL-BASED ADDITIVES FOR MODIFYING MATERIAL PROPERTIES OF METAL PARTICLE LAYERS SHOWA DENKO MATERIALS CO., LTD. (JP) 2021-09-23 US claimed
EP-3818547-A1 PRINT-ON PASTES WITH METAL-BASED ADDITIVES FOR MODIFYING MATERIAL PROPERTIES OF METAL PARTICLE LAYERS Showa Denko Materials Co., Ltd. (JP) 2021-05-12 EP claimed
CN-112384992-A Printing paste with metal-based additives for modifying the material properties of a metal particle layer 昭和电工材料株式会社 2021-02-19 CN claimed
US-20200316645-A1 ATOMIC LAYER ETCHING ON MICRODEVICES AND NANODEVICES THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2020-10-08 US claimed
EP-1828431-B1 METHOD FOR PREPARING NANOPARTICLES OF SILVER OR A SILVER ALLOY, DISPERSED ON A SUBSTRATE, BY CHEMICAL VAPOUR DEPOSITION COMMISSARIAT ENERGIE ATOMIQUE (FR) 2020-08-05 EP claimed
EP-1943282-B1 PREPARATION OF AMINO-SILANE TERMINATED POLYMER BY USING ORGANIC BISMUTH CATALYST AND CURED POLYMER THEREFROM BY USING NON-TIN CATALYST MOMENTIVE PERFORMANCE MAT INC (US) 2020-03-04 EP claimed
US-10381227-B2 Methods of atomic layer etching (ALE) using sequential, self-limiting thermal reactions THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2019-08-13 US claimed
EP-1074603-B1 Method and apparatus for producing oxide-nanocrystals LEDVANCE GMBH (DE) 2018-04-04 EP claimed
US-20170365478-A1 NOVEL METHODS OF ATOMIC LAYER ETCHING (ALE) USING SEQUENTIAL, SELF-LIMITING THERMAL REACTIONS THE REGENT OF THE UNIV OF COLORADO A BODY CORPORATE (US) 2017-12-21 US claimed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP claimed
EP-0668105-A2 Olefin production PHILLIPS PETROLEUM COMPANY (US) 1995-08-23 EP claimed
EP-0633265-A1 Process for preparation of beta-cyanoalkylsilanes DOW CORNING CORPORATION (US) 1995-01-11 EP claimed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP claimed
US-5283348-A Process for preparation of β-cyanoalkylsilanes DOW CORNING CORPORATION (US) 1994-02-01 US claimed
US-5126469-A Supported catalysts for addition of silicon hydrides to α,β-unsaturated olefinic nitriles DOW CORNING CORPORATION (US) 1992-06-30 US claimed
US-5126468-A Diamine and copper or copper compound DOW CORNING CORPORATION (US) 1992-06-30 US claimed
US-5103033-A Catalytic reaction of unsaturated nitriles and silicon hydride DOW CORNING CORPORATION (US) 1992-04-07 US claimed
US-4031063-A Polyester resin compositions CELANESE CORPORATION (US) 1977-06-21 US claimed