SCHEMBL6209915

SCHEMBL6209915

C=CC(=O)NC(O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11584273 0.82 TSHR (0.46)
SCHEMBL1065203 0.79 TSHR (0.54)
SCHEMBL108995 0.79
SCHEMBL275353 0.78 TSHR (0.52)
SCHEMBL9204367 0.77 TSHR (0.46)
SCHEMBL1944726 0.77 TSHR (0.50)
SCHEMBL2437345 0.76 TSHR (0.56)
SCHEMBL399092 0.76 TSHR (0.50)
SCHEMBL10593260 0.74
SCHEMBL11461905 0.74 TSHR (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117924788-A Thermal expansion microsphere and preparation method thereof 万华化学集团股份有限公司 2024-04-26 CN claimed
EP-4748893-A1 PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION Namics Corporation (JP) 2026-05-27 EP disclosed
CN-117924788-A Thermal expansion microsphere and preparation method thereof 万华化学集团股份有限公司 2024-04-26 CN disclosed
CN-117352671-A Negative electrode material, preparation method thereof and lithium ion battery 贝特瑞新材料集团股份有限公司 2024-01-05 CN disclosed
CN-113365680-A Syringe filled with resin composition, method for producing same, and method for storing same 纳美仕有限公司 2021-09-07 CN disclosed
CN-112292735-A Conductive paste for vacuum printing 纳美仕有限公司 2021-01-29 CN disclosed
EP-1506239-A2 SURFACE GRAFT MODIFIED RESINS AND FORMATION THEREOF Phenomenex, Inc. (US) 2005-02-16 EP disclosed
WO-2003064478-A2 SURFACE GRAFT MODIFIED RESINS AND FORMATION THEREOF PHENOMENEX, INC. (US) 2003-08-07 WO disclosed
EP-0274699-B1 A PROCESS FOR PREPARING ACRYLATE-FUNCTIONAL ORGANOPOLYSILOXANE-URETHANE COPOLYMERS WACKER-CHEMIE GMBH (DE) 1992-07-22 EP disclosed
US-4762887-A Process for preparing acrylate-functional organopolysiloxane-urethane copolymers WACKER SILICONES CORPORATION (US) 1988-08-09 US disclosed
EP-0274699-A2 A process for preparing acrylate-functional organopolysiloxane-urethane copolymers WACKER-CHEMIE GMBH (DE) 1988-07-20 EP disclosed