Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9095491 | 1.00 | TDP1 (0.53) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL14319836 | 1.00 | TDP1 (0.53) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL9092832 | 1.00 | TDP1 (0.53) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL29876881 | 0.87 | TSHR (0.47) | TDP1LMNATSHRALDH1A1 | |
| E968 SCHEMBL18493349 | 0.83 | TDP1 (0.77) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL12530836 | 0.82 | LMNA (0.53) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL16442166 | 0.82 | LMNA (0.61) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL15484287 | 0.82 | LMNA (0.53) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL9740003 | 0.81 | TSHR (0.47) | TDP1LMNAL3MBTL1TSHRALDH1A1 | |
| SCHEMBL15942861 | 0.80 | TDP1 (0.63) | TDP1LMNAL3MBTL1TSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | claimed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | claimed |
| CN-120019333-A | Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same | YC化学制品株式会社 | 2025-05-16 | — | — | CN | claimed |
| WO-2024106711-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | 와이씨켐 주식회사 | 2024-05-23 | — | — | WO | claimed |
| US-20230266672-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-08-24 | — | — | US | claimed |
| EP-4212958-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2023-07-19 | — | — | EP | claimed |
| CN-116097398-A | Process liquid composition for extreme ultraviolet lithography and pattern forming method using the same | 荣昌化学制品株式会社 | 2023-05-09 | — | — | CN | claimed |
| US-20220342313-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2022-10-27 | — | — | US | claimed |
| EP-4036648-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Young Chang Chemical Co., Ltd. (KR) | 2022-08-03 | — | — | EP | claimed |
| CN-114450640-A | Process liquid composition for lithography and pattern formation method using the same | 荣昌化学制品株式会社 | 2022-05-06 | — | — | CN | claimed |
| WO-2022055128-A1 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | 영창케미칼 주식회사 | 2022-03-17 | — | — | WO | claimed |
| WO-2021060672-A1 | PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | 영창케미칼 주식회사 | 2021-04-01 | — | — | WO | claimed |
| EP-1165058-B1 | AZALIDE ANTIBIOTICS FOR THE TOPICAL TREATMENT OR PREVENTION OF OCULAR INFECTIONS | INSITE VISION INC (US) | 2005-05-25 | — | — | EP | claimed |
| EP-4621488-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | Ycchem Co., Ltd. (KR) | 2025-09-24 | — | — | EP | disclosed |
| US-20250236813-A1 | RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME | YCCHEM CO., LTD. (KR) | 2025-07-24 | — | — | US | disclosed |
| US-20250206939-A1 | CURABLE SULFONATED POLYMER COMPOSITIONS | NOTARK CORPORATION (US) | 2025-06-26 | — | — | US | disclosed |
| EP-1172400-B1 | THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY | YUPO CORP (JP) | 2005-12-28 | — | — | EP | disclosed |
| US-6586106-B2 | Ink transfer, adhesion and aging stability, and being satisfactory in back ghost when offset printing using oxidation polymerization type ink is performed on both faces | YUPO CORPORATION (JP) | 2003-07-01 | — | — | US | disclosed |
| US-20020054991-A1 | Thermoplastic resin film satisfactory in printability | YUPO CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1172400-A1 | THERMOPLASTIC RESIN FILM WITH SATISFACTORY PRINTABILITY | Yupo Corporation (JP) | 2002-01-16 | — | — | EP | disclosed |