Hydrochloric Acid

Hydrochloric Acid

SCHEMBL6230893

C1=CCC([Ti+3]C23CC4CC(CC(C4)C2)C3)=C1.[Cl-].[Cl-].[Cl-]

nearest known ligand 0.36

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Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.36
GRIN2D O15399 1/20 0.30
GRIN3B O60391 1/20 0.30
GRIN1 Q05586 1/20 0.30
GRIN2A Q12879 1/20 0.30
GRIN2B Q13224 1/20 0.30
GRIN2C Q14957 1/20 0.30
GRIN3A Q8TCU5 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7124697 0.66 EPHX2 (0.41) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
Hydrochloric Acid SCHEMBL5610235 0.65
Hydrochloric Acid SCHEMBL1539626 0.64
Hydrochloric Acid SCHEMBL12821872 0.62
SCHEMBL1132616 0.60 EPHX2 (0.37) EPHX2GRIN2DGRIN3BGRIN1GRIN2A
Iodide SCHEMBL1539644 0.59
Fluoride Ion SCHEMBL1539670 0.59
Bromide SCHEMBL1539634 0.59
Hydrochloric Acid SCHEMBL4633108 0.59
Hydrochloric Acid SCHEMBL7642213 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1520862-A2 Butadiene polymer, and process for producing conjugated diene polymer JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2005-04-06 EP disclosed
EP-1054026-B1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JP AGENCY OF INDUSTRIALSCIENCE (JP) 2004-12-08 EP disclosed
US-6653430-B1 Addition polymerizing in presence of Group 4 metal complex having cyclopentadienyl structure and alumoxane cocatalyst; high cis configuration JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-11-25 US disclosed
EP-1054026-A1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-11-22 EP disclosed