SCHEMBL6232628

SCHEMBL6232628

C=CC(=O)NC12CCC(CC1)C2

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 10/20 0.38
EPHX1 P07099 5/20 0.38
ALDH1A1 P00352 3/20 0.32
TSHR P16473 1/20 0.32
MAPK1 P28482 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
TGM2 P21980 1/20 0.32
HPGD P15428 1/20 0.31
LMNA P02545 1/20 0.31
THRB P10828 1/20 0.31
HTT P42858 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10351100 0.89 EPHX2 (0.34) EPHX2EPHX1TSHR
SCHEMBL1070205 0.82 EPHX2 (0.59) EPHX2EPHX1ALDH1A1LMNATHRB
SCHEMBL3068816 0.79 EPHX2 (0.60) EPHX2EPHX1ALDH1A1LMNAHTT
SCHEMBL3071718 0.79 EPHX2 (0.43) EPHX2EPHX1SMN1; SMN2
SCHEMBL1605302 0.77 EPHX2 (0.41) EPHX2EPHX1
SCHEMBL3087397 0.76 EPHX2 (0.38) EPHX2EPHX1ALDH1A1HPGDLMNA
SCHEMBL9011407 0.75 EPHX2 (0.40) EPHX2EPHX1ALDH1A1TSHRHTT
SCHEMBL12783368 0.74 EPHX2 (0.37) EPHX2EPHX1ALDH1A1
SCHEMBL3082239 0.74 EPHX2 (0.60) EPHX2EPHX1ALDH1A1HTTSMN1; SMN2
SCHEMBL4086300 0.73 EPHX1 (0.36) EPHX2EPHX1ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1790772-A Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device SEIKO EPSON CORP (JP) 2006-06-21 CN disclosed
EP-0857766-B1 Process for producing aqueous ink for inkjet printing KAO CORP (JP) 2005-04-20 EP disclosed
EP-1013709-B1 Hindered amine compound, resin composition, polyurethane fiber and production method and use thereof TOYO BOSEKI (JP) 2005-03-09 EP disclosed
CN-1135252-C Hindered amine compound, resin composition, polyurethane fibre, process for preparing polyurethane fibre, and elastic braided fabric ����ļ���ʽ���� 2004-01-21 CN disclosed
US-6486238-B1 Hindered amine compound, resin composition, polyurethane fiber and production method and use thereof TOYO BOSEKI KABUSHIKI KAISHA (JP) 2002-11-26 US disclosed
EP-1013709-A1 Hindered amine compound, resin composition, polyurethane fiber and production method and use thereof Toyo Boseki Kabushiki Kaisha (JP) 2000-06-28 EP disclosed
CN-1257888-A Hindered amine compound, resin composition, polyurethane fibre, process for preparing polyurethane fibre, and elastic braided fabric TOYO BOSEKI (JP) 2000-06-28 CN disclosed
US-5998501-A DISSOLVING POLYMER AND HYDROPHOBIC DYE IN WATER INSOLUBLE SOLVENT; ADDING WATER AND NEUTRALIZING AGENT; EMULSIFICATION; DESOLVENTIZING KAO CORPORATION (JP) 1999-12-07 US disclosed
EP-0857766-A1 Process for producing aqueous ink for inkjet printing KAO CORPORATION (JP) 1998-08-12 EP disclosed
EP-0379305-B1 Low odor adhesive compositions MINNESOTA MINING & MFG (US) 1994-05-11 EP disclosed
EP-0572900-A2 Coating and its use in a process for preparing multilayer coatings Herberts Gesellschaft mit beschränkter Haftung (DE) 1993-12-08 EP disclosed
US-4945006-A UNSATURATED CYCLIC AMIDES, ANAEROBIC PROCESS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-07-31 US disclosed
EP-0379305-A1 Low odor adhesive compositions MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-07-25 EP disclosed