SCHEMBL6233671

SCHEMBL6233671

CCCCCCCCCCCCCC(=O)N(CC)CCS(=O)(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.47
CES2 O00748 3/20 0.39
CES1 P23141 3/20 0.39
KDM5A P29375 3/20 0.39
PHF8 Q9UPP1 3/20 0.39
KDM4C Q9H3R0 2/20 0.39
GPR84 Q9NQS5 6/20 0.38
PPARG P37231 6/20 0.38
PPARD Q03181 6/20 0.38
PPARA Q07869 6/20 0.38
HDAC11 Q96DB2 5/20 0.38
TSHR P16473 4/20 0.38
ALDH1A1 P00352 2/20 0.38
TLR2 O60603 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
FABP4 P15090 2/20 0.38
PTPN1 P18031 2/20 0.38
SLC22A6 Q4U2R8 1/20 0.38
SLC22A8 Q8TCC7 1/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6227329 1.00 LMNA (0.47) LMNACES2CES1KDM5APHF8
SCHEMBL14089279 1.00 LMNA (0.47) LMNACES2CES1KDM5APHF8
SCHEMBL8486641 0.86 KDM5A (0.49) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL8486081 0.86 KDM5A (0.49) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL27100287 0.85 LMNA (0.46) LMNACES2CES1KDM5APHF8
SCHEMBL27100285 0.85 LMNA (0.46) LMNACES2CES1KDM5APHF8
Potassium SCHEMBL9225233 0.84 KDM5A (0.48) KDM5APHF8KDM4CGPR84PPARG
Sulfuric Acid SCHEMBL28897633 0.83 LMNA (0.47) LMNACES2CES1KDM5APHF8
SCHEMBL8486430 0.82 CA12 (0.42) CES2CES1KDM5APHF8KDM4C
SCHEMBL2502289 0.82 FFAR4 (0.46) GPR84FFAR1FFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118105308-A Skin cleansing composition 花王株式会社 2024-05-31 CN disclosed
EP-1516914-A9 DETERGENT COMPOSITIONS SHISEIDO COMPANY LIMITED (JP) 2005-11-02 EP disclosed
US-20050176615-A1 Detergent compositions SHISEIDO COMPANY, LTD. (JP) 2005-08-11 US disclosed
EP-1516914-A1 DETERGENT COMPOSITIONS SHISEIDO COMPANY LIMITED (JP) 2005-03-23 EP disclosed
EP-0702079-A2 Low-irritant detergent compositions Kao Corporation (JP) 1996-03-20 EP disclosed