Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL717105 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL5270387 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL28195967 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL28273597 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL28379673 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL25329629 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL28323245 | 0.82 | — | — | |
| SCHEMBL29795443 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL7847798 | 0.71 | — | — | |
| SCHEMBL29450745 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050127332-A1 | Protective colloids; organometallic sulfides, alcohols, esters, carboxylic acids, mercaptans, and/or ethers; gold, platinum, silver, palladium, rhodium, iridium, ruthenium, osmium, tungsten, nickel, tantalum, bismuth, lead, zinc, tin, titanium, and/or aluminum; screen printing; preventing voids | TANAKA KIKINZOKU KOGYO K.K. | 2005-06-16 | — | — | US | disclosed |
| EP-1542239-A1 | Metal paste and film formation method using the same | Tanaka Kikinzoku Kogyo K.K. (JP) | 2005-06-15 | — | — | EP | disclosed |
| JP-2001058997-A | ORGANIC FUNCTIONAL COCYCLIC SILOXANE | DOW CORNING CORP | 2001-03-06 | — | — | JP | disclosed |