SCHEMBL6234059

SCHEMBL6234059

CCCCOC(=O)CC(C)CC(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.43
ALDH1A1 P00352 1/20 0.42
ATM Q13315 1/20 0.40
NPSR1 Q6W5P4 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
MAPT P10636 1/20 0.39
MAPK1 P28482 1/20 0.39
DGKA P23743 1/20 0.39
TSHR P16473 2/20 0.38
HPGD P15428 1/20 0.38
RAD52 P43351 1/20 0.38
FAAH O00519 1/20 0.37
HCAR2 Q8TDS4 1/20 0.36
HTR2C P28335 1/20 0.36
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23292692 0.95 NAAA (0.50) NAAAALDH1A1NPSR1L3MBTL1MAPT
SCHEMBL13733267 0.93 NAAA (0.53) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL13734568 0.93 NAAA (0.53) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL2130997 0.93 NAAA (0.53) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL2130443 0.93 NAAA (0.53) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL2131723 0.93 NAAA (0.53) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL4407978 0.89 NAAA (0.41) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL4412782 0.89 NAAA (0.41) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL4408719 0.89 NAAA (0.41) NAAANPSR1L3MBTL1MAPTMAPK1
SCHEMBL8041406 0.89 NAAA (0.33) NAAAALDH1A1NPSR1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106574152-B Adhesive film and display member using the same 三星SDI株式会社 2021-03-02 CN disclosed
CN-100509922-C Two-step mixing process for making absorbent polymers STOCKHAUSEN CHEM FAB GMBH (DE) 2009-07-08 CN disclosed
CN-101058676-A Two-step mixing process for producing an absorbent polymer STOCKHAUSEN CHEM FAB GMBH (DE) 2007-10-24 CN disclosed
CN-1880363-A Absorbent material with improved blocking properties STOCKHAUSEN CHEM FAB GMBH (DE) 2006-12-20 CN disclosed
CN-1264898-C Absorbent structure with improved blocking properties STOCKHAUSEN CHEM FAB GMBH (DE) 2006-07-19 CN disclosed
CN-1708541-A Two-step mixing process for making absorbent polymers STOCKHAUSEN CHEM FAB GMBH (DE) 2005-12-14 CN disclosed
EP-1529066-A1 AID AND METHOD FOR PROCESSING THERMOPLASTIC COMPOSITIONS Baerlocher GmbH (DE) 2005-05-11 EP disclosed
EP-1487882-A1 BASE POLYMER OBTAINED BY HYDROGENATION Stockhausen GmbH (DE) 2004-12-22 EP disclosed
WO-2004022606-A1 AID AND METHOD FOR PROCESSING THERMOPLASTIC COMPOSITIONS BAERLOCHER GMBH (DE) 2004-03-18 WO disclosed
CN-1471555-A Absorbent structure with improved blocking properties 施托克赫森两合公司 2004-01-28 CN disclosed
WO-2003080682-A1 BASE POLYMER OBTAINED BY HYDROGENATION STOCKHAUSEN GMBH (DE) 2003-10-02 WO disclosed