SCHEMBL623606

SCHEMBL623606

CC(O)COC(=O)C(S)S

nearest known ligand 0.44

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.44
MAPK1 P28482 1/20 0.37
TSHR P16473 3/20 0.37
HSD17B10 Q99714 1/20 0.36
LMNA P02545 1/20 0.31
RNPEP Q9H4A4 1/20 0.31
TDP1 Q9NUW8 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8444590 0.85 MAPT (0.44) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL24414476 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL24414494 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL1498188 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL24414542 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL24414506 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL24414470 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL447235 0.79 MAPT (0.47) MAPTMAPK1TSHRHSD17B10LMNA
SCHEMBL10915446 0.76 KDM4E (0.35) LMNA
SCHEMBL28519812 0.76 MAPT (0.48) MAPTMAPK1TSHRHSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9994667-B2 Polythiourethane-based casting resin having high fracture resistance and low specific weight Bruno Bock Chemische Fabrik GmbH and Co. KG (DE) 2018-06-12 US disclosed
EP-2603488-B1 DIFUNCTIONAL (METH)ACRYLATE WRITING MONOMERS COVESTRO DEUTSCHLAND AG (DE) 2017-04-26 EP disclosed
US-20160053044-A1 POLYTHIOURETHANE-BASED CASTING RESIN HAVING HIGH FRACTURE RESISTANCE AND LOW SPECIFIC WEIGHT BRUNO BOCK CHEMISCHE FABRIK GMBH & CO. KG (DE) 2016-02-25 US disclosed
US-9057946-B2 Difunctional (meth)acrylate writing monomers BAYER INTELLECTUAL PROPERTY GMBH (DE) 2015-06-16 US disclosed
US-20130252140-A1 DIFUNCTIONAL (METH)ACRYLATE WRITING MONOMERS BAYER MATERIALSCIENCE AG (DE) 2013-09-26 US disclosed
EP-2603488-A1 DIFUNCTIONAL (METH)ACRYLATE WRITING MONOMERS Bayer Intellectual Property GmbH (DE) 2013-06-19 EP disclosed
WO-2012020061-A1 DIFUNCTIONAL (METH)ACRYLATE WRITING MONOMERS BAYER MATERIALSCIENCE AG (DE) 2012-02-16 WO disclosed