Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.48 |
| ▸ | CA4 | P22748 | 1/20 | 0.48 |
| ▸ | GBA1 | P04062 | 1/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.33 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.33 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.32 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14639771 | 1.00 | CA1 (0.48) | CA1CA2CA4GBA1EPHX1 | |
| SCHEMBL10005748 | 0.95 | — | — | |
| SCHEMBL349547 | 0.83 | GBA1 (0.42) | CA1CA2CA4GBA1TRPA1 | |
| SCHEMBL20991957 | 0.81 | CA1 (0.50) | CA1CA2CA4EPHX1TRPA1 | |
| SCHEMBL19886143 | 0.81 | CA1 (0.50) | CA1CA2CA4EPHX1TRPA1 | |
| SCHEMBL17751226 | 0.81 | CA1 (0.50) | CA1CA2CA4EPHX1TRPA1 | |
| SCHEMBL3480513 | 0.78 | GBA1 (0.47) | CA1CA2CA4GBA1TRPA1 | |
| SCHEMBL598630 | 0.78 | CA1 (0.46) | CA1CA2CA4EPHX1TRPA1 | |
| SCHEMBL20693175 | 0.78 | CA1 (0.46) | CA1CA2CA4EPHX1TRPA1 | |
| SCHEMBL16191287 | 0.78 | CA1 (0.46) | CA1CA2CA4EPHX1TRPA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8859181-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859181-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8632939-B2 | Polymer, chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-21 | — | — | US | disclosed |
| US-8632939-B2 | Polymer, chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-2362268-B1 | Polymer, chemically amplified positive resist compositions and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-2362267-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-01-23 | — | — | EP | disclosed |
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110212390-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110212391-A1 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110212391-A1 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110212390-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| EP-2362267-A1 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| EP-2362268-A1 | Polymer, chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| WO-2010140483-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD | セントラル硝子株式会社 (JP) | 2010-12-09 | — | — | WO | disclosed |
| WO-2007001283-A2 | CHEMICAL SYNTHESIS OF LOW MOLECULAR WEIGHT POLYGLUCOSAMINES AND POLYGALACTOSAMINES | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2007-01-04 | — | — | WO | disclosed |
| WO-2005012222-A1 | ALICYCLIC ESTER WITH MUSK FRAGRANCE | SYMRISE GMBH & CO. KG (DE) | 2005-02-10 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | FRG1, AFF2, AFF1 | CA1 1068/4885CA2 3273/4885CA4 2977/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.