Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | PPARG | P37231 | 1/20 | 0.46 |
| ▸ | NCOA2 | Q15596 | 1/20 | 0.46 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.46 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL7367416 | 0.98 | TSHR (0.50) | TSHRTDP1L3MBTL1MEN1KMT2A | |
| SCHEMBL11243157 | 0.94 | TSHR (0.54) | TSHRPOLBLMNARAB9AALDH1A1 | |
| Hydrochloric Acid SCHEMBL11236997 | 0.92 | TSHR (0.53) | TSHRPOLBLMNARAB9AALDH1A1 | |
| Hydrochloric Acid SCHEMBL8520932 | 0.92 | TSHR (0.53) | TSHRPOLBLMNARAB9AALDH1A1 | |
| SCHEMBL1191120 | 0.90 | GAA (0.54) | TDP1MEN1KMT2APOLBHPGD | |
| SCHEMBL11726421 | 0.90 | RAB9A (0.46) | TSHRTDP1MEN1KMT2APOLB | |
| SCHEMBL11725934 | 0.88 | TDP1 (0.47) | TSHRTDP1MEN1KMT2APOLB | |
| SCHEMBL11723423 | 0.88 | TDP1 (0.47) | TSHRTDP1MEN1KMT2APOLB | |
| SCHEMBL11732310 | 0.88 | TDP1 (0.47) | TSHRTDP1MEN1KMT2APOLB | |
| SCHEMBL11726316 | 0.88 | TDP1 (0.47) | TSHRTDP1MEN1KMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-101830795-A | Preparation method of chrysanthemic acid with high optical purity | UNIV SHANDONG TECHNOLOGY | 2010-09-15 | — | — | CN | claimed |
| EP-0644887-A1 | PROCESS FOR THE PREPARATION OF CLAVULANIC ACID. | SMITHKLINE BEECHAM PLC (GB) | 1995-03-29 | — | — | EP | claimed |
| WO-1993025557-A1 | PROCESS FOR THE PREPARATION OF CLAVULANIC ACID | SMITHKLINE BEECHAM PLC (GB) | 1993-12-23 | — | — | WO | claimed |
| US-4322548-A | COMPRISING CONTACTING WITH A PHENYLGLYCINE ESTER | KAY FRIES, INC. (US) | 1982-03-30 | — | — | US | claimed |
| CN-122095314-A | Photosensitive resin laminate, method for forming resist pattern, and method for manufacturing wiring board having conductor pattern | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2026100708-A1 | PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | disclosed |
| WO-2025095102-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114174922-B | Photosensitive resin composition and photosensitive element | 旭化成株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| WO-2025005146-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE | 旭化成株式会社 | 2025-01-02 | — | — | WO | disclosed |
| WO-1996022296-A1 | CLAVULANIC ACID EXTRACTION PROCESS | SMITHKLINE BEECHAM P.L.C. (GB) | 1996-07-25 | — | — | WO | disclosed |
| EP-0672669-A1 | Process for the preparation of clavulanic acid | SMITHKLINE BEECHAM PLC (GB) | 1995-09-20 | — | — | EP | disclosed |
| EP-0672670-A1 | Process for the preparation of clavulanic acid | SMITHKLINE BEECHAM PLC (GB) | 1995-09-20 | — | — | EP | disclosed |
| EP-0644887-A1 | PROCESS FOR THE PREPARATION OF CLAVULANIC ACID. | SMITHKLINE BEECHAM PLC (GB) | 1995-03-29 | — | — | EP | disclosed |
| WO-1993025557-A1 | PROCESS FOR THE PREPARATION OF CLAVULANIC ACID | SMITHKLINE BEECHAM PLC (GB) | 1993-12-23 | — | — | WO | disclosed |
| US-4492683-A | Method for inhibiting the growth of fungi with phenyl glycine compounds | BUFFALO COLOR CORPORATION (US) | 1985-01-08 | — | — | US | disclosed |
| US-4322548-A | COMPRISING CONTACTING WITH A PHENYLGLYCINE ESTER | KAY FRIES, INC. (US) | 1982-03-30 | — | — | US | disclosed |