SCHEMBL6239899

SCHEMBL6239899

CCCCCCCCCCCCC=C/[C]=C/CCCCCCCCCCCCC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FAAH O00519 4/20 0.46
TRPV1 Q8NER1 1/20 0.46
HMGCR P04035 2/20 0.45
TSHR P16473 2/20 0.41
TERT O14746 3/20 0.41
CYP1A2 P05177 2/20 0.41
MAPT P10636 2/20 0.41
CYP2C19 P33261 2/20 0.41
BLM P54132 2/20 0.41
HSD17B10 Q99714 2/20 0.41
FABP4 P15090 2/20 0.41
PTPN1 P18031 2/20 0.41
PPARG P37231 2/20 0.41
KMT2A Q03164 2/20 0.41
PPARD Q03181 2/20 0.41
PPARA Q07869 2/20 0.41
GMNN O75496 1/20 0.41
USP2 O75604 1/20 0.41
LMNA P02545 1/20 0.41
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11511228 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL3924992 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL887671 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL14809663 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL5872440 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL8374816 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL5521453 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL6880256 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL20482020 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT
SCHEMBL9338672 1.00 FAAH (0.46) FAAHTRPV1HMGCRTSHRTERT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
EP-0885405-B1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS SUMITOMO BAKELITE CO (JP) 2005-06-08 EP disclosed
US-6790579-B1 PHOTOACID INITIATOR GENERATES ACID EFFECTING POLARITY CHANGE RENDERING POLYMER WATER SOLUBLE IN AREAS EXPOSED TO IMAGING SOURCE; INTEGRATED CIRCUITS, SEMICONDUCTORS SUMITOMO BAKELITE CO., LTD. (JP) 2004-09-14 US disclosed
US-6723486-B2 POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST SUMITOMO BAKELITE CO., LTD. (JP) 2004-04-20 US disclosed
EP-0862589-B1 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS SUMITOMO BAKELITE CO (JP) 2004-02-18 EP disclosed
EP-1157058-B1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS SUMITOMO BAKELITE CO (JP) 2003-06-25 EP disclosed
US-20020128408-A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-09-12 US disclosed
US-6420503-B1 POLYCARBONS/OTHER/ SUMITOMO BAKELITE CO. LTD. (JP) 2002-07-16 US disclosed
EP-0906588-B1 PHOTODEFINABLE DIELECTRIC COMPOSITIONS GOODRICH CO B F (US) 2002-03-27 EP disclosed
EP-1157058-A1 METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS The B.F. Goodrich Company (US) 2001-11-28 EP disclosed
WO-1997033198-A1 PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS THE B.F. GOODRICH COMPANY (US) 1997-09-12 WO disclosed
WO-1997020871-A2 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 1997-06-12 WO disclosed
EP-0758657-A2 Addition polymers derived from norbornene-functional monomers and process therefor The B.F. Goodrich Company (US) 1997-02-19 EP disclosed
WO-1996037529-A1 HOMOPOLYMERS AND COPOLYMERS OF CATIONICALLY POLYMERIZABLE MONOMERS AND METHOD OF THEIR PREPARATION THE B.F. GOODRICH COMPANY (US) 1996-11-28 WO disclosed
WO-1996037526-A1 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING FUNCTIONAL SUBSTITUENTS THE B.F. GOODRICH COMPANY (US) 1996-11-28 WO disclosed
US-5571881-A Addition polymers derived from norbornene-functional monomers and process therefor THE B. F. GOODRICH COMPANY (US) 1996-11-05 US disclosed
US-5569730-A HAVING TERMINAL END GROUP DERIVED FROM CHAIN TRANSFER AGENT CONTAINING TERMINAL OLEFINIC DOUBLE BOND THE B. F. GOODRICH COMPANY (US) 1996-10-29 US disclosed
EP-0729480-A1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR The B.F. Goodrich Company (US) 1996-09-04 EP disclosed
WO-1995014048-A9 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR 1995-07-27 WO disclosed
WO-1995014048-A1 ADDITION POLYMERS DERIVED FROM NORBORNENE-FUNCTIONAL MONOMERS AND PROCESS THEREFOR THE B.F. GOODRICH COMPANY (US) 1995-05-26 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR FAAH 3439/4885TRPV1 2776/4885HMGCR 3732/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.