⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL500505 | 0.74 | — | — | |
| SCHEMBL16509351 | 0.73 | — | — | |
| SCHEMBL14134642 | 0.73 | — | — | |
| SCHEMBL24767418 | 0.73 | — | — | |
| SCHEMBL10138648 | 0.69 | — | — | |
| SCHEMBL19214057 | 0.69 | — | — | |
| SCHEMBL21278095 | 0.67 | — | — | |
| SCHEMBL23195409 | 0.67 | — | — | |
| SCHEMBL20221387 | 0.66 | — | — | |
| SCHEMBL14727722 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9709892-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9557643-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9527809-B2 | Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160324974-A1 | METHOD FOR PREPARING A POLYMERIC REAGENT | NEKTAR THERAPEUTICS | 2016-11-10 | — | — | US | disclosed |
| US-9470980-B2 | Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device | FUJIFILM CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| EP-2013202-B1 | SUBSTITUTED PYRAZINONE DERIVATIVES FOR USE AS A MEDICINE | JANSSEN PHARMACEUTICA NV (BE) | 2010-06-16 | — | — | EP | disclosed |
| US-20100087442-A1 | DIKETOHYDRAZINE DERIVATIVE COMPOUNDS AND DRUGS CONTAINING THE COMPOUNDS AS THE ACTIVE INGREDIENT | ONO PHARMACEUTICAL CO., LTD (JP) | 2010-04-08 | — | — | US | disclosed |
| US-7655804-B2 | N-[(1S)-3-{(2Z)-2-[(4R)-3,4-dimethyl-1,3-thiazolidin-2-ylidene]hydrazino}-2,3-dioxo-1-(tetrahydro-2H-pyran-4-yl)propyl]cycloheptanecarboxamide; cysteine protease inhibitors; for the treatment of inflammatory, immune, ischemic, respiratory,circulatory, neuronal, blood, hepatic and metabolic diseases | ONO PHARMACEUTICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| EP-1581479-A1 | PROCESS FOR THE SYNTHESIS OF 3,3A,6,6A-TETRAHYDRO-2H-CYCLOPENTAN[B]FURAN-2-ONE | Pharmacia & Upjohn Company LLC (US) | 2005-10-05 | — | — | EP | disclosed |
| US-20040147775-A1 | Process for the synthesis of 3.3A.6.6A-tetrahydro-2H-cyclopentan[b]furan-2-one | PHARMACIA & UPJOHN COMPANY | 2004-07-29 | — | — | US | disclosed |
| WO-2004056749-A1 | PROCESS FOR THE SYNTHESIS OF 3,3A,6,6A-TETRAHYDRO-2H-CYCLOPENTAN ‘B ! FURAN-2-ONE | PHARMACIA & UPJOHN COMPANY LLC (US) | 2004-07-08 | — | — | WO | disclosed |
| US-4520193-A | Cephalosporin derivatives | RHONE-POULENC INDUSTRIES (FR) | 1985-05-28 | — | — | US | disclosed |
| US-4302584-A | FROM AN ACETAMIDO-ACETAL OR KETENE-ACETAL-AMINAL AND 3-METHYL-BUT-2-EN-1-OL | BASF AKTIENGESELLSCHAFT (DE) | 1981-11-24 | — | — | US | disclosed |
| US-4015012-A | ANTHELMINTICS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-03-29 | — | — | US | disclosed |
| US-3970699-A | 4-Acylaminophenylacetamidines and a method for their preparation | BAYER AKTIENGESELLSCHAFT (DT) | 1976-07-20 | — | — | US | disclosed |