⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21679513 | 0.74 | ALDH1A1 (0.35) | — | |
| SCHEMBL6259996 | 0.74 | — | — | |
| SCHEMBL13072231 | 0.67 | ALDH1A1 (0.30) | — | |
| SCHEMBL11177757 | 0.67 | — | — | |
| SCHEMBL762779 | 0.61 | — | — | |
| SCHEMBL2803526 | 0.61 | — | — | |
| SCHEMBL112049 | 0.61 | — | — | |
| SCHEMBL5190463 | 0.61 | — | — | |
| SCHEMBL8054697 | 0.59 | — | — | |
| SCHEMBL1577819 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119307150-A | Water-based primer composition | 盛势达技研株式会社 | 2025-01-14 | — | — | CN | disclosed |
| US-12096767-B2 | Residual disinfectant composition | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2024-09-24 | — | — | US | disclosed |
| EP-3328373-B1 | DISINFECTANT COMPOSITION WITH RAPID ANTIVIRAL EFFICACY | KIMBERLY CLARK CO (US) | 2023-06-07 | — | — | EP | disclosed |
| EP-3569682-B1 | LIQUID HARD SURFACE CLEANING COMPOSITIONS HAVING IMPROVED VISCOSITY | PROCTER & GAMBLE (US) | 2022-12-07 | — | — | EP | disclosed |
| WO-2022162221-A1 | DETERGENT COMPOSITION | UNILEVER IP HOLDINGS B.V. (NL) | 2022-08-04 | — | — | WO | disclosed |
| US-10995302-B2 | Liquid acidic hard surface cleaning compositions having improved viscosity | THE PROCTER & GAMBLE COMPANY (US) | 2021-05-04 | — | — | US | disclosed |
| US-20210092949-A1 | Residual Disinfectant Composition | KIMBERLY-CLARK WORLDWIDE, INC. | 2021-04-01 | — | — | US | disclosed |
| US-10920180-B2 | Liquid acidic hard surface cleaning compositions providing improved maintenance of surface shine, and prevention of water marks and splash marks | THE PROCTER & GAMBLE COMPANY (US) | 2021-02-16 | — | — | US | disclosed |
| CN-112305861-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-02-02 | — | — | CN | disclosed |
| US-10874100-B2 | Residual disinfectant composition | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2020-12-29 | — | — | US | disclosed |
| WO-2004016087-A1 | DISINFECTING COMPOSITIONS CONTAINING A POLYMER COMPLEX OF AN ORGANIC ACID | RECKITT BENCKISER INC. (US) | 2004-02-26 | — | — | WO | disclosed |
| WO-2003038025-A1 | HARD SURFACE CLEANING AND DISINFECTING COMPOSITIONS | RECKITT BENCKISER INC (US) | 2003-05-08 | — | — | WO | disclosed |
| US-6465392-B1 | HEAT-SENSITIVE RECORDING MATERIAL INCLUDING A HEAT-SENSITIVE RECORDING LAYER AND A PROTECTIVE LAYER PROVIDED ON A SUBSTRATE; EXCELLENT SCRATCH RESISTANCE AND CAUSES NO STICKING AND RESIDUE ADHESION AT A HEAT-SENSITIVE RECORDING HEAD | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| US-6339041-B1 | TRANSPARENCY, GLOSSINESS, LIGHT-FASTNESS, SCRATCH RESISTANCE, FRICTION RESISTANCE AND LUBRICITY | FUJI PHOTO FILM CO., LTD. (JP) | 2002-01-15 | — | — | US | disclosed |
| US-6261993-B1 | Heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-17 | — | — | US | disclosed |
| EP-0995613-A2 | Heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-26 | — | — | EP | disclosed |
| US-6034033-A | SILICONE POLYMER AS PROTECTIVE COATING | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| EP-0663610-B1 | Silver halide light-sensitive photographic material | KONISHIROKU PHOTO IND (JP) | 1999-06-16 | — | — | EP | disclosed |
| US-5476747-A | High contrast images | KONICA CORPORATION (JP) | 1995-12-19 | — | — | US | disclosed |
| EP-0663610-A2 | Silver halide light-sensitive photographic material | KONICA CORPORATION (JP) | 1995-07-19 | — | — | EP | disclosed |