⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL14890180 | 0.97 | ALDH1A1 (0.42) | — | |
| Hydrochloric Acid SCHEMBL8686731 | 0.97 | — | — | |
| SCHEMBL6863429 | 0.83 | ALDH1A1 (0.43) | — | |
| Pyridine SCHEMBL19534767 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL30090510 | 0.78 | SMN1; SMN2 (0.34) | — | |
| SCHEMBL28419828 | 0.76 | ALDH1A1 (0.38) | — | |
| SCHEMBL9416833 | 0.76 | ALDH1A1 (0.47) | — | |
| SCHEMBL8930064 | 0.76 | TSHR (0.47) | — | |
| SCHEMBL1685072 | 0.75 | ALDH1A1 (0.33) | — | |
| SCHEMBL1685071 | 0.75 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 939 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3870960-B1 | CHEMICAL LIQUID MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING CHEMICAL LIQUID | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-04-15 | — | — | EP | claimed |
| EP-3883663-B9 | CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-25 | — | — | EP | claimed |
| EP-3883663-B1 | CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-10-01 | — | — | EP | claimed |
| US-12365658-B2 | Benzothia(di)azepine compounds and their use as bile acid modulators | ALBIREO AB (SE) | 2025-07-22 | — | — | US | claimed |
| CN-117769684-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2024-03-26 | — | — | CN | claimed |
| CN-117716297-A | Diluent composition and method for manufacturing semiconductor device using the same | 三菱瓦斯化学株式会社 | 2024-03-15 | — | — | CN | claimed |
| CN-117716290-A | Resist composition and method for forming resist film using the same | 三菱瓦斯化学株式会社 | 2024-03-15 | — | — | CN | claimed |
| CN-115151863-A | Resist composition and method of using the same | 三菱瓦斯化学株式会社 | 2022-10-04 | — | — | CN | claimed |
| WO-2021159938-A1 | BOTANICAL INSECTICIDE FOR PREVENTING AND CONTROLLING CROP PESTS | 浙江大学 | 2021-08-19 | — | — | WO | claimed |
| CN-109563106-B | Silver ion carboxylate alkyl primary amine complexes | 柯达公司 | 2021-07-27 | — | — | CN | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-1271244-B1 | Method for fabricating an organic thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2004-08-25 | — | — | EP | claimed |
| US-6627495-B2 | Method for forming a capacitor in a semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2003-09-30 | — | — | US | claimed |
| US-20020094657-A1 | Method for forming a capacitor in a semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2002-07-18 | — | — | US | claimed |
| EP-0379691-B2 | Process for preparing unsaturated carboxylic acid or ester thereof | MITSUBISHI GAS CHEMICAL CO (JP) | 2001-01-03 | — | — | EP | claimed |
| EP-0828737-A1 | ISOXAZOLINE AND ISOXAZOLE DERIVATIVES AS INTEGRIN RECEPTOR ANTAGONISTS | THE DU PONT MERCK PHARMACEUTICAL COMPANY (US) | 1998-03-18 | — | — | EP | claimed |
| EP-0429800-B2 | Process for preparing unsaturated carboxylic acid ester | MITSUBISHI GAS CHEMICAL CO (JP) | 1997-10-08 | — | — | EP | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0379691-A1 | Process for preparing unsaturated carboxylic acid or ester thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1990-08-01 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |