SCHEMBL6270129

SCHEMBL6270129

CCN(CC)c1ccc(/C=C2/CC/C(=C\c3ccc(N(CC)CCO)cc3)C2=O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FGFR1 P11362 1/20 0.51
CYP1A2 P05177 3/20 0.49
CYP3A4 P08684 1/20 0.47
CYP2C9 P11712 1/20 0.47
MEN1 O00255 9/20 0.47
KMT2A Q03164 9/20 0.47
MAPT P10636 7/20 0.47
LMNA P02545 5/20 0.47
MAPK1 P28482 4/20 0.47
L3MBTL1 Q9Y468 3/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
NPC1 O15118 1/20 0.47
RAB9A P51151 1/20 0.47
MCOLN3 Q8TDD5 1/20 0.47
ALDH1A1 P00352 8/20 0.46
ALDH3A1 P30838 1/20 0.46
ALDH1A3 P47895 1/20 0.46
MAOB P27338 1/20 0.46
GSK3B P49841 1/20 0.45
BCHE P06276 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6270133 1.00 FGFR1 (0.51) FGFR1CYP1A2CYP3A4CYP2C9MEN1
SCHEMBL5953483 0.93 CYP1A2 (0.58) FGFR1CYP1A2CYP2C9MEN1KMT2A
SCHEMBL5953479 0.93 CYP1A2 (0.58) FGFR1CYP1A2CYP2C9MEN1KMT2A
SCHEMBL2847156 0.90 CYP1A2 (0.58) FGFR1CYP1A2CYP3A4CYP2C9MEN1
SCHEMBL29099922 0.90 CYP1A2 (0.58) FGFR1CYP1A2CYP3A4CYP2C9MEN1
SCHEMBL51252 0.90 CYP1A2 (0.58) FGFR1CYP1A2CYP3A4CYP2C9MEN1
SCHEMBL51253 0.90 CYP1A2 (0.58) FGFR1CYP1A2CYP3A4CYP2C9MEN1
SCHEMBL352162 0.84 CYP1A2 (0.69) FGFR1CYP1A2CYP2C9MEN1KMT2A
SCHEMBL352161 0.84 CYP1A2 (0.69) FGFR1CYP1A2CYP2C9MEN1KMT2A
SCHEMBL14556409 0.80 CYP1A2 (0.46) FGFR1CYP1A2CYP3A4CYP2C9MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 EP disclosed
US-6355396-B1 HIGH SENSITIVITY AND GOOD LATITUDE IN DEVELOPMENT, FOR PRODUCING DIRECT PLATE PRODUCTION PROCESS AND ENABLES AN IMAGE TO BE FORMED WITH HIGH SENSITIVITY WITH AN INFRARED LASER FUJI PHOTO FILM CO., LTD. (JP) 2002-03-12 US disclosed
EP-1038668-A2 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP disclosed