SCHEMBL6274170

SCHEMBL6274170

CCOC(=O)C(C)=CBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6274167 1.00
SCHEMBL7037637 0.85 NPSR1 (0.50)
SCHEMBL2547694 0.85 NPSR1 (0.50)
SCHEMBL111294 0.84
SCHEMBL111293 0.84
SCHEMBL12789347 0.84
Hydrochloric Acid SCHEMBL28340904 0.82 GLO1 (0.52)
SCHEMBL8306704 0.82
SCHEMBL79140 0.82
SCHEMBL2346338 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024176222-A1 MODIFIED PROTEINS OR PEPTIDES FOR COVALENT TARGETING YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) 2024-08-29 WO disclosed
CN-118290434-A Spiropiperidine derivative containing alpha-methylene-gamma-butyrolactone, preparation method and application thereof 南开大学 2024-07-05 CN disclosed
CN-117650244-B Structure and method for protecting lithium metal anode material and application thereof 安徽盟维新能源科技有限公司 2024-04-30 CN disclosed
CN-117650244-A Structure and method for protecting lithium metal anode material and application thereof 安徽盟维新能源科技有限公司 2024-03-05 CN disclosed
CN-113443985-B Cerium dioxide nanoparticle-based organic/inorganic hybrid photoresist composition 中国科学院理化技术研究所 2022-09-09 CN disclosed
CN-114929661-A Process for preparing alpha-substituted acrylic acid esters 陶氏环球技术有限责任公司 2022-08-19 CN disclosed
CN-114901627-A Process for preparing alpha-substituted acrylic esters 陶氏环球技术有限责任公司 2022-08-12 CN disclosed
CN-113443985-A Cerium dioxide nanoparticle-based organic/inorganic hybrid photoresist composition 中国科学院理化技术研究所 2021-09-28 CN disclosed
EP-3246309-A1 METHOD FOR TREATING TIN COMPOUND IN REACTION MIXTURE Nissan Chemical Industries, Ltd. (JP) 2017-11-22 EP disclosed
CN-1980962-A Acid-sensitive copolymer and use thereof MITSUI CHEMICALS INC (JP) 2007-06-13 CN disclosed
EP-1344805-B1 New ink compositions for ink jet printing AGFA GEVAERT (BE) 2005-12-21 EP disclosed
US-20050277708-A1 Ink compositions for ink jet printing AGFA-GEVAERT (BE) 2005-12-15 US disclosed
US-6630501-B1 Treatment of cancer due to overexpression of enzymes of this family COMMISSARIAT A L'ENERGIE ATOMIQUE 2003-10-07 US disclosed
EP-1344805-A1 New ink compositions for ink jet printing Agfa-Gevaert (BE) 2003-09-17 EP disclosed