SCHEMBL6280865

SCHEMBL6280865

O=S(=O)(O)C(F)(F)C(F)(F)OC(F)(Cl)C(F)(F)Cl

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6278397 0.91
SCHEMBL6129851 0.84 ALDH1A1 (0.31) ALDH1A1L3MBTL1
SCHEMBL6287023 0.84 ALDH1A1 (0.33) ALDH1A1L3MBTL1
SCHEMBL6285295 0.82 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL6129888 0.81 ALDH1A1 (0.38) ALDH1A1L3MBTL1
SCHEMBL29741385 0.80
SCHEMBL6282016 0.80 ALDH1A1 (0.31) ALDH1A1L3MBTL1
SCHEMBL6399346 0.79
SCHEMBL6129871 0.79
SCHEMBL28748712 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6855476-B2 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-02-15 US disclosed
US-20020197558-A1 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2002-12-26 US disclosed