Known targets — ChEMBL curated mechanism
KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2
The experimentally established mechanism targets of Guanidine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | BLM | P54132 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CA5A | P35218 | 2/20 | 0.35 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | NT5E | P21589 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Guanidine SCHEMBL28148835 | 0.88 | KDM4E (0.38) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Thiourea SCHEMBL28217736 | 0.88 | KDM4E (0.38) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Hno SCHEMBL27276626 | 0.82 | CA2 (0.47) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Hydrazine SCHEMBL7178457 | 0.82 | CA2 (0.47) | KDM4EBLMCYP2C19CA2TSHR | |
| Hydroxyamine SCHEMBL27479784 | 0.82 | CA2 (0.47) | KDM4EBLMCYP2C19CA2TSHR | |
| Hydrazine SCHEMBL715886 | 0.82 | CA2 (0.47) | KDM4EBLMCYP2C19CA2TSHR | |
| SCHEMBL56331 | 0.82 | CA2 (0.54) | CA2TSHRCA5ACA5BCA1 | |
| SCHEMBL3781 | 0.82 | — | — | |
| SCHEMBL28601800 | 0.81 | CYP2D6 (0.39) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| SCHEMBL2830995 | 0.81 | KDM4E (0.39) | KDM4EBLMCYP2D6CYP2C19NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1721493-A | Multiple process polishing solution for chemical mechanical planarization | ROHM & HAAS ELECT MAT (US) | 2006-01-18 | — | — | CN | claimed |
| US-6971945-B2 | Multi-step polishing solution for chemical mechanical planarization | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2005-12-06 | — | — | US | claimed |
| US-20050194357-A1 | MULTI-STEP POLISHING SOLUTION FOR CHEMICAL MECHANICAL PLANARIZATION | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-09-08 | — | — | US | claimed |
| CN-105294429-B | Preparation method of aralkyl salicylic acid derivative | 锦州康泰润滑油添加剂股份有限公司 | 2018-09-18 | — | — | CN | disclosed |
| CN-100591407-C | Method for separating hydrogen chloride and phosgene | BASF AG | 2010-02-24 | — | — | CN | disclosed |
| CN-101018596-A | Method for separating hydrogen chloride and phosgene | BASF AG (DE) | 2007-08-15 | — | — | CN | disclosed |
| CN-1324105-C | Multiple process polishing solution for chemical mechanical planarization | CMP ROHM & HAAS ELECTRONIC MAT (US) | 2007-07-04 | — | — | CN | disclosed |
| CN-1721493-A | Multiple process polishing solution for chemical mechanical planarization | ROHM & HAAS ELECT MAT (US) | 2006-01-18 | — | — | CN | disclosed |
| US-6971945-B2 | Multi-step polishing solution for chemical mechanical planarization | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2005-12-06 | — | — | US | disclosed |
| US-20050194357-A1 | MULTI-STEP POLISHING SOLUTION FOR CHEMICAL MECHANICAL PLANARIZATION | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-09-08 | — | — | US | disclosed |