SCHEMBL6284115

SCHEMBL6284115

C=C(C)OC(=C)C.C=C(CCO)OC(=C)CCO

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL84208 0.86
SCHEMBL6284105 0.81
Ethylene Glycol SCHEMBL5364211 0.80 HSD17B10 (0.47) HSD17B10TDP1
SCHEMBL28401911 0.79
Propanol SCHEMBL28285587 0.75 HSD17B10 (0.43) HSD17B10TDP1
Alcohol SCHEMBL11643051 0.74 TDP1 (0.47) HSD17B10TDP1
SCHEMBL27437745 0.72 TDP1 (0.60) HSD17B10TDP1
SCHEMBL29972 0.72
Ethylene Glycol SCHEMBL1155675 0.72 HSD17B10 (0.41) HSD17B10TDP1
SCHEMBL12328993 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6951705-B2 Polymers for photoresist compositions for microlithography E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-10-04 US disclosed
US-20030211417-A1 Polymers for photoresist compositions for microlithography DUPONT ELECTRONICS, INC. 2003-11-13 US disclosed
EP-1279069-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2003-01-29 EP disclosed
WO-2001086352-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-11-15 WO disclosed