⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6284115 | 0.81 | HSD17B10 (0.38) | — | |
| SCHEMBL9180781 | 0.79 | — | — | |
| SCHEMBL84208 | 0.78 | — | — | |
| SCHEMBL2490676 | 0.73 | — | — | |
| SCHEMBL3285653 | 0.73 | ALDH1A1 (0.44) | — | |
| SCHEMBL28401911 | 0.72 | — | — | |
| SCHEMBL3310904 | 0.70 | THRB (0.53) | — | |
| SCHEMBL8994872 | 0.69 | THRB (0.39) | — | |
| SCHEMBL14471004 | 0.69 | — | — | |
| SCHEMBL11570210 | 0.68 | HSD17B10 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6951705-B2 | Polymers for photoresist compositions for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-10-04 | — | — | US | disclosed |
| US-20030211417-A1 | Polymers for photoresist compositions for microlithography | DUPONT ELECTRONICS, INC. | 2003-11-13 | — | — | US | disclosed |
| EP-1279069-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-01-29 | — | — | EP | disclosed |
| WO-2001086352-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | disclosed |