SCHEMBL6284575

SCHEMBL6284575

O=C(O)CCCCCCCCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)OC(F)(F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.32
TSHR P16473 1/20 0.32
NFKB1 P19838 1/20 0.32
PMP22 Q01453 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6129883 0.90
SCHEMBL6129874 0.85
SCHEMBL6286869 0.83
SCHEMBL6282662 0.80 FAAH (0.31)
SCHEMBL14228102 0.77
SCHEMBL23788184 0.74 TSHR (0.46) ALDH1A1LMNATSHRNFKB1PMP22
SCHEMBL1608462 0.74 TSHR (0.46) ALDH1A1LMNATSHRNFKB1PMP22
SCHEMBL7884128 0.74 TSHR (0.46) ALDH1A1LMNATSHRNFKB1PMP22
SCHEMBL23788019 0.74 TSHR (0.46) ALDH1A1LMNATSHRNFKB1PMP22
SCHEMBL9449787 0.74 TSHR (0.46) ALDH1A1LMNATSHRNFKB1PMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6855476-B2 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-02-15 US disclosed
US-20020197558-A1 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2002-12-26 US disclosed