SCHEMBL629199

SCHEMBL629199

Nc1ccc(C(=O)O)c2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 3/20 0.54
NR4A1 P22736 1/20 0.52
NR4A2 P43354 1/20 0.52
NR4A3 Q92570 1/20 0.52
IDO1 P14902 2/20 0.50
HDAC3 O15379 1/20 0.50
EP300 Q09472 1/20 0.50
KAT2B Q92831 1/20 0.50
KAT8 Q9H7Z6 1/20 0.50
NCOR2 Q9Y618 1/20 0.50
NSD2 O96028 2/20 0.49
WDR5 P61964 1/20 0.48
ALDH1A1 P00352 2/20 0.48
ALOX15 P16050 1/20 0.48
KDM4E B2RXH2 3/20 0.47
HPGD P15428 2/20 0.47
TSHR P16473 2/20 0.47
HSD17B10 Q99714 2/20 0.47
LDHA P00338 1/20 0.47
CYP2C9 P11712 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5750101 0.98 CDC25B (0.53) CDC25BNR4A1NR4A2NR4A3IDO1
SCHEMBL9083361 0.89 CDC25B (0.50) CDC25BNR4A1NR4A2NR4A3IDO1
SCHEMBL29549315 0.87 CDC25B (0.64) CDC25BNR4A1NR4A2NR4A3IDO1
SCHEMBL689824 0.87 CDC25B (0.64) CDC25BNR4A1NR4A2NR4A3IDO1
SCHEMBL29406630 0.86 NR4A1 (0.65) CDC25BNR4A1NR4A2NR4A3WDR5
SCHEMBL30838412 0.86 NR4A1 (0.65) CDC25BNR4A1NR4A2NR4A3WDR5
SCHEMBL30838413 0.86 NR4A1 (0.65) CDC25BNR4A1NR4A2NR4A3WDR5
SCHEMBL28798 0.86 NR4A1 (0.65) CDC25BNR4A1NR4A2NR4A3WDR5
Hydrochloric Acid SCHEMBL10447811 0.85 CDC25B (0.62) CDC25BNR4A1NR4A2NR4A3IDO1
Hydrochloric Acid SCHEMBL11552292 0.85 CDC25B (0.62) CDC25BNR4A1NR4A2NR4A3IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 386 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025085689-A1 EXTRACELLULAR SMALL MOLECULE ACTIVATORS TARGETING BESTROPHIN CHANNELS FOR DISEASE TREATMENT THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK (US) 2025-04-24 WO claimed
CN-119781246-A Photosensitive polyimide resin composition, cured film, and preparation method and application thereof 吉林奥来德光电材料股份有限公司 2025-04-08 CN claimed
CN-117416983-A Naphthoxyhc acid and/or its derivative acid radical intercalation hydrotalcite-like compound and its preparation method 中国科学院青海盐湖研究所 2024-01-19 CN claimed
CN-115010924-B Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition 吉林奥来德光电材料股份有限公司 2023-10-13 CN claimed
CN-115322970-B Hybridoma cell strain secreting azorubine monoclonal antibody and application thereof 江南大学 2023-04-07 CN claimed
CN-115322970-A Hybridoma cell strain secreting azorubine monoclonal antibody and application thereof 江南大学 2022-11-11 CN claimed
CN-115010924-A Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film 吉林奥来德光电材料股份有限公司 2022-09-06 CN claimed
WO-2022035843-A1 TOPOISOMERASE INHIBITORS NANOMEDICINE INNOVATION CENTER, LLC (US) 2022-02-17 WO claimed
EP-1630605-B1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2017-10-11 EP claimed
CN-102770182-B Substituted isoquinolinones and quinazolinones NOVARTIS AG (CH) 2014-10-29 CN claimed
WO-2001000671-A1 DERIVATIVE COMPOUNDS XOMA TECHNOLOGY LTD. (US) 2001-01-04 WO claimed
US-4018743-A Process for preparing triketoimidazolidines HOECHST AKTIENGESELLSCHAFT (DT) 1977-04-19 US claimed
JP-59152960-A None JP disclosed
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-16 US disclosed
US-12583973-B2 Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
EP-4660704-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
US-4083684-A AZO DYES, WASHFASTNESS, PHOTOSTABILITY, SOLVENT RESISTANCE BASF AKTIENGESELLSCHAFT (DT) 1978-04-11 US disclosed
US-4042578-A POLYESTERS BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1977-08-16 US disclosed
US-4041025-A FOR HYDROPHOBIC FIBERS SUCH AS POLYESTERS, YELLOW TO BLUE-GREEN SHADES BASF AKTIENGESELLSCHAFT (DT) 1977-08-09 US disclosed
US-3998802-A POLYAMIDES, CELLULOSE ESTERS, POLYESTERS, POLYACRYLONITRILES BASF AKTIENGESELLSCHAFT (DT) 1976-12-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT ARCN1, PRDM9, LBR CDC25B 3902/4885NR4A1 589/4885NR4A2 963/4885
US-12583973-B2 Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component PRDM9, ARCN1, PUF60 CDC25B 3983/4885NR4A1 642/4885NR4A2 1062/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.