Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDC25B | P30305 | 4/20 | 0.64 |
| ▸ | MMP2 | P08253 | 1/20 | 0.61 |
| ▸ | NSD2 | O96028 | 2/20 | 0.57 |
| ▸ | NR4A2 | P43354 | 2/20 | 0.57 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.57 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | CASP6 | P55212 | 2/20 | 0.50 |
| ▸ | G6PD | P11413 | 1/20 | 0.50 |
| ▸ | CASP7 | P55210 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | IDO1 | P14902 | 2/20 | 0.47 |
| ▸ | TTR | P02766 | 1/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29549315 | 1.00 | CDC25B (0.64) | CDC25BMMP2NSD2NR4A2NR4A1 | |
| Hydrochloric Acid SCHEMBL10447811 | 0.98 | CDC25B (0.62) | CDC25BMMP2NSD2NR4A2NR4A1 | |
| Hydrochloric Acid SCHEMBL11552292 | 0.98 | CDC25B (0.62) | CDC25BMMP2NSD2NR4A2NR4A1 | |
| SCHEMBL629199 | 0.87 | CDC25B (0.54) | CDC25BMMP2NSD2NR4A2NR4A1 | |
| SCHEMBL29406795 | 0.86 | NR4A1 (0.73) | CDC25BMMP2NR4A2NR4A1NR4A3 | |
| SCHEMBL27985 | 0.86 | NR4A1 (0.73) | CDC25BMMP2NR4A2NR4A1NR4A3 | |
| Hydrochloric Acid SCHEMBL5750101 | 0.85 | CDC25B (0.53) | CDC25BMMP2NSD2NR4A2NR4A1 | |
| Bromide SCHEMBL11318433 | 0.84 | NR4A1 (0.70) | CDC25BMMP2NR4A2NR4A1NR4A3 | |
| Hydrochloric Acid SCHEMBL2457250 | 0.84 | NR4A1 (0.70) | CDC25BMMP2NR4A2NR4A1NR4A3 | |
| SCHEMBL28575439 | 0.84 | NR4A1 (0.70) | CDC25BMMP2NR4A2NR4A1NR4A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 761 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119979085-A | Graphene conductive adhesive and preparation method thereof | 深圳稀导技术有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119038536-A | Modified carbon nanotube, preparation thereof, easily-dispersible and storage-stable carbon nanotube conductive paste containing modified carbon nanotube and preparation method of easily-dispersible and storage-stable carbon nanotube conductive paste | 立邦涂料（中国）有限公司 | 2024-11-29 | — | — | CN | claimed |
| CN-116642873-B | Reusable SERS (surface enhanced Raman Scattering) sensing chip and preparation method and application thereof | 江南大学 | 2024-07-30 | — | — | CN | claimed |
| CN-115010924-B | Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition | 吉林奥来德光电材料股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-116642873-A | Reusable SERS (surface enhanced Raman Scattering) sensing chip and preparation method and application thereof | 江南大学 | 2023-08-25 | — | — | CN | claimed |
| CN-116178689-A | Liquid crystal polymer and preparation method and application thereof | 深圳大学 | 2023-05-30 | — | — | CN | claimed |
| CN-115010924-A | Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-06 | — | — | CN | claimed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| WO-2015021948-A1 | AGENT FOR NUCLEATION OF POLYOLEFIN AND ELIMINATION OF FOULING IN A GAS PHASE POLYMERISATION REACTOR | POLYMER INSTITUTE BRNO, SPOL. S.R.O. (CZ) | 2015-02-19 | — | — | WO | claimed |
| US-5973076-A | MOLDING; CONTROLLING TEMPERATURE IN PRESENCE OF AN AMIDE COMPOUND | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | claimed |
| EP-0776933-B1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEM CO LTD (JP) | 1999-08-04 | — | — | EP | claimed |
| EP-0776933-A1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1997-06-04 | — | — | EP | claimed |
| US-5391699-A | Containing an aromatic amine carboxylate, heat resistance | BRIDGESTONE CORPORATION (JP) | 1995-02-21 | — | — | US | claimed |
| EP-0571095-A2 | Polyester copolymer and process for the production of the same | BRIDGESTONE CORPORATION (JP) | 1993-11-24 | — | — | EP | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122029489-A | Photosensitive resin composition, cured product, display device, and electronic component | 东丽株式会社 | 2026-05-12 | — | — | CN | disclosed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-0557721-A2 | Crystalline polypropylene resin composition and amide compounds | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1993-09-01 | — | — | EP | disclosed |
| EP-0480705-A1 | Monoazo lake pigment, process for producing the same and its use | TOYO INK MANUFACTURING CO., LTD. (JP) | 1992-04-15 | — | — | EP | disclosed |
| US-4061618-A | Process for preparing stable polyurethane latices | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1977-12-06 | — | — | US | disclosed |