SCHEMBL6294773

SCHEMBL6294773

CCC(C)O[Si](C)(C)O[Si](C)(O[Si](C)(C)OC(C)CC)O[Si](C)(O[Si](C)(C)OC(C)CC)O[Si](C)(C)OC(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5467140 0.98
SCHEMBL26676540 0.87
SCHEMBL26676626 0.83
SCHEMBL5454836 0.83
SCHEMBL427237 0.82 TSHR (0.30)
SCHEMBL2925009 0.78
SCHEMBL646646 0.76 TSHR (0.30)
SCHEMBL1226913 0.71
SCHEMBL5462786 0.71
SCHEMBL18255495 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6930393-B2 hydrolyzable silicon compound or at least one product resulting from at least partial hydrolysis condensation of the silicon compound SHIN-ETSU CHEMICAL CO. LTD. (JP) 2005-08-16 US disclosed
US-20040195660-A1 Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-10-07 US disclosed