⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL248235 | 0.85 | — | — | |
| SCHEMBL19272491 | 0.83 | — | — | |
| SCHEMBL872282 | 0.81 | — | — | |
| SCHEMBL1889664 | 0.76 | — | — | |
| SCHEMBL18831111 | 0.76 | — | — | |
| SCHEMBL16243667 | 0.74 | — | — | |
| SCHEMBL25194603 | 0.73 | — | — | |
| SCHEMBL8163818 | 0.72 | — | — | |
| SCHEMBL1634746 | 0.72 | — | — | |
| Propylene Glycol SCHEMBL17106651 | 0.71 | TDP1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6958848-B2 | Capsules, materials for use therein and electrophoretic media and displays containing such capsules | E INK CORPORATION (US) | 2005-10-25 | — | — | US | claimed |
| US-20040012839-A1 | CAPSULES, MATERIALS FOR USE THEREIN AND ELECTROPHORETIC MEDIA AND DISPLAYS CONTAINING SUCH CAPSULES | E INK CORPORATION (US) | 2004-01-22 | — | — | US | claimed |
| US-6645692-B2 | Mixture of acid generator, binder and surfactant | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | claimed |
| US-6958848-B2 | Capsules, materials for use therein and electrophoretic media and displays containing such capsules | E INK CORPORATION (US) | 2005-10-25 | — | — | US | disclosed |
| US-20040012839-A1 | CAPSULES, MATERIALS FOR USE THEREIN AND ELECTROPHORETIC MEDIA AND DISPLAYS CONTAINING SUCH CAPSULES | E INK CORPORATION (US) | 2004-01-22 | — | — | US | disclosed |
| US-6645692-B2 | Mixture of acid generator, binder and surfactant | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | disclosed |
| US-6645692-B2 | Mixture of acid generator, binder and surfactant | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-11-11 | — | — | US | disclosed |
| US-20020012874-A1 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-31 | — | — | US | disclosed |