⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6299237 | 1.00 | — | — | |
| SCHEMBL11072813 | 0.75 | — | — | |
| SCHEMBL2235100 | 0.66 | — | — | |
| SCHEMBL2511542 | 0.65 | — | — | |
| SCHEMBL11075785 | 0.65 | — | — | |
| SCHEMBL11072886 | 0.64 | — | — | |
| SCHEMBL11072884 | 0.64 | — | — | |
| SCHEMBL11072850 | 0.61 | — | — | |
| Propylene Carbonate SCHEMBL10684473 | 0.61 | SMN1; SMN2 (0.36) | — | |
| SCHEMBL303944 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6913867-B2 | Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern | KANSAI PAINT CO., LTD. (JP) | 2005-07-05 | — | — | US | disclosed |
| US-20020068237-A1 | Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern | KANSAI PAINT CO., LTD. (JP) | 2002-06-06 | — | — | US | disclosed |
| US-6140025-A | Negative type photosensitive resin composition and method for forming resist pattern | KANSAI PAINT CO., LTD. (JP) | 2000-10-31 | — | — | US | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |