SCHEMBL6299239

SCHEMBL6299239

C=C=COCCCCCC

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.36
THRB P10828 2/20 0.36
MEN1 O00255 1/20 0.35
HTT P42858 1/20 0.35
KMT2A Q03164 1/20 0.35
MAPT P10636 1/20 0.35
LPAR3 Q9UBY5 6/20 0.34
CA1 P00915 6/20 0.34
CA2 P00918 6/20 0.34
CA9 Q16790 6/20 0.34
LPAR2 Q9HBW0 5/20 0.34
LPAR1 Q92633 2/20 0.34
CA12 O43570 2/20 0.34
CA3 P07451 2/20 0.34
CA4 P22748 2/20 0.34
CA6 P23280 2/20 0.34
CA5A P35218 2/20 0.34
CA7 P43166 2/20 0.34
CA14 Q9ULX7 2/20 0.34
CA5B Q9Y2D0 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29001883 1.00 TSHR (0.36) TSHRTHRBMEN1HTTKMT2A
SCHEMBL18085812 0.78 TSHR (0.35) TSHRTHRBMEN1HTTKMT2A
SCHEMBL28634644 0.77 CA1 (0.43) TSHRTHRBLPAR3CA1CA2
SCHEMBL28690087 0.76 ALDH1A1 (0.32)
SCHEMBL5136181 0.74
SCHEMBL36065 0.73 TSHR (0.46) TSHRTHRBMEN1HTTKMT2A
SCHEMBL50150 0.73
SCHEMBL292094 0.73 TSHR (0.46) TSHRTHRBMEN1HTTKMT2A
SCHEMBL825462 0.73 TSHR (0.46) TSHRTHRBMEN1HTTKMT2A
SCHEMBL826318 0.73 TSHR (0.46) TSHRTHRBMEN1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6913867-B2 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern KANSAI PAINT CO., LTD. (JP) 2005-07-05 US disclosed
US-20020068237-A1 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern KANSAI PAINT CO., LTD. (JP) 2002-06-06 US disclosed
US-6140025-A Negative type photosensitive resin composition and method for forming resist pattern KANSAI PAINT CO., LTD. (JP) 2000-10-31 US disclosed
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed
CN-1015107-B Process for producing pyrimidine or triazine derivative TAKEDA CHEMICAL INDUSTRIES LTD (JP) 1991-12-18 CN disclosed
CN-86107113-A Herbicidal compounds, process for their preparation and their use 1987-05-27 CN disclosed