SCHEMBL6302569

SCHEMBL6302569

CCC(NC(C)N)C([SiH3])(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17373476 0.74
SCHEMBL7173595 0.72
SCHEMBL1140838 0.69
SCHEMBL27230622 0.68
SCHEMBL4810389 0.65
SCHEMBL17373477 0.63 SHBG (0.35)
SCHEMBL9540501 0.61
SCHEMBL144338 0.61
SCHEMBL536313 0.60
SCHEMBL5173876 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6841645-B1 Peroxidised polyorganosiloxanes (POS), one of the methods for preparing them and their uses as bleaching agent in dental compositions RHODIA CHIMIE (FR) 2005-01-11 US disclosed
US-20050003995-A1 Peroxide-comprising polyorganosiloxanes (POS), one of their processes of preparation and their uses, in particular as bleaching agent in dental compositions DROMARD ADRIEN (FR) 2005-01-06 US disclosed
US-6326061-B1 CONTACTING TEXTILE MATERIAL WITH FORMULATION COMPRISING SILANE OR ORGANOSILOXANE HAVING MONOVALENT SIC-BONDED HYDROCARBON RADICAL HAVING PRIMARY, SECONDARY AND/OR TERTIARY AMINO GROUPS, AND ISO)OXYALKYL RADICAL ATTACHED TO SILOXANE WACKER-CHEMIE GMBH (DE) 2001-12-04 US disclosed