2-Ethylhexanoic Acid

2-Ethylhexanoic Acid

SCHEMBL6305613

CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].CCCCC(CC)C(=O)[O-].[Lu+3]

nearest known ligand 0.91

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 10/20 0.91
▸ MAPK1 P28482 1/20 0.61
▸ CA1 P00915 7/20 0.59
▸ CYP3A4 P08684 2/20 0.56
▸ TSHR P16473 2/20 0.56
▸ NFKB1 P19838 2/20 0.56
▸ NPSR1 Q6W5P4 2/20 0.56
▸ SLC1A3 P43003 1/20 0.42
▸ SLC1A2 P43004 1/20 0.42
▸ SLC1A1 P43005 1/20 0.42
▸ USP2 O75604 1/20 0.41
▸ CA7 P43166 1/20 0.41
▸ CA14 Q9ULX7 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Ethylhexanoic Acid SCHEMBL1002810 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL11415998 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL27603 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL268182 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL2464684 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL23802667 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL2423179 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL21569275 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL20582677 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR
2-Ethylhexanoic Acid SCHEMBL887054 0.95 CA2 (0.91) CA2MAPK1CA1CYP3A4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112514078-B Coating liquid for forming metal oxide film, oxide insulator film, field effect transistor, display element, image display device, and system 株式会社理光 2025-02-11 — — CN disclosed
EP-4391083-A2 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR Ricoh Company, Ltd. (JP) 2024-06-26 — — EP disclosed
EP-3350839-B1 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR RICOH CO LTD (JP) 2024-06-12 — — EP disclosed
EP-3550595-B1 COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM AND A METHOD FOR MANUFACTURING USING THE COATING LIQUID RICOH CO LTD (JP) 2024-04-10 — — EP disclosed
US-11908945-B2 Coating liquid for forming n-type oxide semiconductor film, method for producing n-type oxide semiconductor film, and method for producing field-effect transistor RICOH COMPANY, LTD. (JP) 2024-02-20 — — US disclosed
US-11901431-B2 Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system RICOH COMPANY, LTD. (JP) 2024-02-13 — — US disclosed
CN-110024089-B Oxide or oxynitride insulator film, coating liquid for forming the same, field effect transistor, and method for manufacturing the same 株式会社理光 2023-06-27 — — CN disclosed
US-11502203-B2 Coating liquid for forming metal oxide film, oxide film, field-effect transistor, and method for producing the same RICOH COMPANY, LTD. (JP) 2022-11-15 — — US disclosed
CN-108028270-B Coating liquid for forming n-type oxide semiconductor film, method for manufacturing n-type oxide semiconductor film, and method for manufacturing field effect transistor 株式会社理光 2021-10-22 — — CN disclosed
US-20210305394-A1 COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE INSULATOR FILM, FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM RICOH COMPANY, LTD. (JP) 2021-09-30 — — US disclosed
US-20200075768-A1 COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME RICOH COMPANY, LTD. (JP) 2020-03-05 — — US disclosed
EP-3602615-A1 COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME Ricoh Company, Ltd. (JP) 2020-02-05 — — EP disclosed
WO-2020022233-A1 COATING LIQUID FOR FORMING METAL OXIDE FILM, OXIDE INSULATOR FILM, FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM RICOH COMPANY, LTD. (JP) 2020-01-30 — — WO disclosed
EP-3550595-A1 COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD EFFECT TRANSISTOR, AND METHODS FOR MANUFACTURING THESE Ricoh Company, Ltd. (JP) 2019-10-09 — — EP disclosed
US-20190280098-A1 COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME RICOH COMPANY, LTD. (JP) 2019-09-12 — — US disclosed
US-20190051752-A1 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR RICOH COMOANY, LTD. (JP) 2019-02-14 — — US disclosed
EP-3350839-A1 COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR Ricoh Company, Ltd. (JP) 2018-07-25 — — EP disclosed
US-6894182-B2 Aliphatic oligocarbonate polyols prepared in the presence of a catalyst and a process for preparing the same BAYER AKTIENGESELLSCHAFT (DE) 2005-05-17 — — US disclosed
US-20030125576-A1 Aliphatic oligocarbonate polyols prepared in the presence of a catalyst and a process for preparing the same COVESTRO DEUTSCHLAND AG (DE) 2003-07-03 — — US disclosed
EP-1312632-A1 Use of catalysts for the preparation of aliphatic oligocarbonate-polyols Bayer Aktiengesellschaft (DE) 2003-05-21 — — EP disclosed
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