SCHEMBL6310762

SCHEMBL6310762

Nc1ccc(C(F)(F)F)c(N)c1C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.37
GLA P06280 1/20 0.37
GAA P10253 1/20 0.37
TSHR P16473 1/20 0.37
KIF11 P52732 2/20 0.35
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA4 P22748 1/20 0.31
CA6 P23280 1/20 0.31
CA5A P35218 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
CA5B Q9Y2D0 1/20 0.31
FFAR4 Q5NUL3 3/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29962374 1.00 POLB (0.37) POLBGLAGAATSHRKIF11
SCHEMBL25013343 0.85 POLB (0.39) POLBGLAGAATSHRKIF11
SCHEMBL30632227 0.85 POLB (0.39) POLBGLAGAATSHRKIF11
SCHEMBL3193349 0.81 POLB (0.37) POLBGLAGAATSHRKIF11
SCHEMBL7450010 0.79 POLB (0.46) POLBGLAGAATSHRKIF11
SCHEMBL6313808 0.79 KIF11 (0.36) POLBGLAGAATSHRKIF11
SCHEMBL29620304 0.79 KIF11 (0.36) POLBGLAGAATSHRKIF11
SCHEMBL5515872 0.77 GLA (0.34) POLBGLAGAATSHRKIF11
SCHEMBL8066356 0.77 GAA (0.34) POLBGLAGAATSHRKIF11
SCHEMBL10451588 0.77 GLA (0.34) POLBGLAGAATSHRKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
EP-0206951-B1 PROCESS FOR THE PERFLUOROALKYLATION OF AROMATIC DERIVATIVES RHONE-POULENC CHIMIE (FR) 1990-03-21 EP disclosed
US-4731450-A Process for perfluoroalkylation of aromatic derivatives RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1988-03-15 US disclosed
EP-0206951-A2 Process for the perfluoroalkylation of aromatic derivatives RHONE-POULENC CHIMIE (FR) 1986-12-30 EP disclosed