Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CTSL | P07711 | 1/20 | 0.30 |
| ▸ | CTSB | P07858 | 1/20 | 0.30 |
| ▸ | CTSK | P43235 | 1/20 | 0.30 |
| ▸ | SCN1A | P35498 | 1/20 | 0.30 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.30 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14776487 | 0.98 | TSHR (0.36) | TSHR | |
| SCHEMBL14776503 | 0.92 | TSHR (0.33) | TSHRCYP19A1CTSLCTSBCTSK | |
| SCHEMBL3875556 | 0.91 | TSHR (0.38) | TSHR | |
| SCHEMBL14776926 | 0.90 | TSHR (0.33) | TSHR | |
| SCHEMBL8982919 | 0.82 | — | — | |
| SCHEMBL9421293 | 0.82 | TSHR (0.37) | TSHR | |
| SCHEMBL1023799 | 0.81 | TSHR (0.32) | TSHR | |
| SCHEMBL21169961 | 0.79 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL21235113 | 0.79 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL14776505 | 0.79 | TSHR (0.33) | TSHRCYP19A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-58103339-A | — | — | None | — | — | JP | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| WO-2023167186-A1 | POLYMERIZABLE COMPOSITION | 株式会社日本触媒 | 2023-09-07 | — | — | WO | disclosed |
| WO-2023167187-A1 | POLYMERIZABLE COMPOSITION | 株式会社日本触媒 | 2023-09-07 | — | — | WO | disclosed |
| EP-3919525-B1 | POLAR GROUP-CONTAINING OLEFIN COPOLYMER | JAPAN POLYETHYLENE CORP (JP) | 2023-08-09 | — | — | EP | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-11643489-B2 | (Meth)acrylic copolymer, polymer solution, polymer-containing composition, anti-fouling coating composition, and method for producing (meth)acrylic copolymer | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11643489-B2 | (Meth)acrylic copolymer, polymer solution, polymer-containing composition, anti-fouling coating composition, and method for producing (meth)acrylic copolymer | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100048848-A1 | PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090169736-A1 | THERMOSETTING RESIN COMPOSITION, METHOD OF FORMING ANTIHALATION FILM OF SOLID-STATE IMAGING DEVICE, ANTIHALATION FILM FOR SOLID-STATE IMAGING DEVICES, AND SOLID-STATE IMAGING DEVICE | JSR CORPORATION (JP) | 2009-07-02 | — | — | US | disclosed |
| EP-0939109-B1 | UV curable resin composition for coating | FUJIKURA KASEI KK (JP) | 2003-09-24 | — | — | EP | disclosed |
| US-20010008691-A1 | UV CURABLE RESIN COMPOSITION FOR COATING | FUJIKURA KASEI CO., LTD. (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-0939109-A1 | UV curable resin composition for coating | FUJIKURA KASEI CO., LTD. (JP) | 1999-09-01 | — | — | EP | disclosed |
| JP-S58103339-A | NOVEL ACRYLIC ACID ESTER | MITSUBISHI PETROCHEM CO LTD | 1983-06-20 | — | — | JP | disclosed |