Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7771180 | 0.93 | — | — | |
| SCHEMBL3875556 | 0.89 | TSHR (0.38) | TSHR | |
| SCHEMBL14776487 | 0.82 | TSHR (0.36) | TSHR | |
| SCHEMBL7771188 | 0.81 | TSHR (0.38) | TSHRTHRATHRB | |
| SCHEMBL631088 | 0.81 | TSHR (0.35) | TSHR | |
| SCHEMBL8997473 | 0.78 | THRA (0.30) | THRATHRB | |
| SCHEMBL11921523 | 0.77 | MAPT (0.36) | THRATHRB | |
| SCHEMBL14776926 | 0.75 | TSHR (0.33) | TSHR | |
| SCHEMBL14776503 | 0.74 | TSHR (0.33) | TSHR | |
| SCHEMBL28855258 | 0.73 | TSHR (0.32) | TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2799455-B1 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-03-28 | — | — | EP | disclosed |
| EP-2463318-B1 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-14 | — | — | EP | disclosed |
| EP-2799455-A2 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-1882713-B1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-07-03 | — | — | EP | disclosed |
| EP-2128178-B1 | RESIN COMPOSITION FOR OPTICAL MEMBER AND OPTICAL MEMBER OBTAINED FROM THE SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-8394920-B2 | Composition for resin and optical lens obtained therefrom | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8389671-B2 | Resin composition for optical member and optical member obtained from the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-03-05 | — | — | US | disclosed |
| EP-2463318-A1 | Resin composition for optical member and optical member obtained from the same | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-8013084-B2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2011-09-06 | — | — | US | disclosed |
| US-7009031-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1524289-A1 | POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-04-20 | — | — | EP | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20040254258-A1 | Polymerizable composition, optical material comprising the composition and method for producing the material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |
| US-20040158031-A1 | Alicyclic compound for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1398317-A1 | ALICYCLIC COMPOUND FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20040024165-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1319966-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-06-18 | — | — | EP | disclosed |