SCHEMBL6311971

SCHEMBL6311971

NCCc1ccccc1Oc1ccccc1CCN

nearest known ligand 0.77

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 1/20 0.77
TAAR1 Q96RJ0 9/20 0.69
HTR2A P28223 2/20 0.48
KDM4E B2RXH2 1/20 0.43
CXCL8 P10145 1/20 0.43
CYP2A6 P11509 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
LOXL2 Q9Y4K0 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8777069 0.90 HRH1 (0.65) HRH1TAAR1HTR2ACXCL8CYP2A6
SCHEMBL1569927 0.87 HRH1 (1.00) HRH1TAAR1HTR2A
Hydrochloric Acid SCHEMBL6963688 0.86 HRH1 (0.96) HRH1TAAR1HTR2A
SCHEMBL305943 0.82 TAAR1 (1.00) HRH1TAAR1
SCHEMBL29350784 0.82 TAAR1 (1.00) HRH1TAAR1
Iodide SCHEMBL28805523 0.80 TAAR1 (0.96) HRH1TAAR1
Hydrochloric Acid SCHEMBL11152248 0.80 TAAR1 (0.96) HRH1TAAR1
SCHEMBL6319190 0.80 HRH1 (0.52) HRH1TAAR1KDM4ECXCL8
SCHEMBL224549 0.79 TAAR1 (0.70) HRH1TAAR1HTR2ACYP2A6SMN1; SMN2
SCHEMBL147184 0.79 TAAR1 (0.66) HRH1TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012074502-A1 SECONDARY METABOLITE STIMULATION IN PHOTOAUTOTROPHIC CULTURES CHAYIL TECHNOLOGIES, LLC (US) 2012-06-07 WO claimed
EP-1296540-B1 DISPLAY TORAY INDUSTRIES (JP) 2019-10-16 EP disclosed
WO-2012074502-A1 SECONDARY METABOLITE STIMULATION IN PHOTOAUTOTROPHIC CULTURES CHAYIL TECHNOLOGIES, LLC (US) 2012-06-07 WO disclosed
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
EP-0878740-B1 Radiation sensitive polymer composition TORAY INDUSTRIES (JP) 2004-11-10 EP disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
US-6696112-B2 POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS TORAY INDUSTRIES, INC. (JP) 2004-02-24 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed
EP-1296540-A1 DISPLAY TORAY INDUSTRIES, INC. (JP) 2003-03-26 EP disclosed
US-20020162998-A1 Display TORAY INDUSTRIES, INC. (JP) 2002-11-07 US disclosed
US-6090525-A PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE TORAY INDUSTRIES, INC. (JP) 2000-07-18 US disclosed
EP-0878740-A1 Radiation sensitive polymer composition TORAY INDUSTRIES, INC. (JP) 1998-11-18 EP disclosed