SCHEMBL631286

SCHEMBL631286

C=C(C)C(=O)OC(C)OCC(C)C

nearest known ligand 0.59

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.59
ALDH1A1 P00352 3/20 0.43
THRB P10828 1/20 0.33
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7628501 0.91 TSHR (0.53) TSHRALDH1A1THRB
SCHEMBL9681610 0.86 TSHR (0.47) TSHRALDH1A1THRBTDP1
SCHEMBL25475956 0.83 TSHR (0.47) TSHRALDH1A1THRB
SCHEMBL3267819 0.83 TSHR (0.47) TSHRALDH1A1THRB
SCHEMBL9555207 0.82 TSHR (0.45) TSHRALDH1A1THRB
SCHEMBL36100 0.82 TSHR (0.45) TSHRALDH1A1THRB
SCHEMBL538063 0.80 TSHR (0.50) TSHRALDH1A1THRBTDP1
SCHEMBL27146370 0.80 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL3855601 0.80 TSHR (0.44) TSHRALDH1A1THRBTDP1
SCHEMBL11213007 0.79 TSHR (0.53) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 258 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1643084-B Self-polishing antifouling paint JOTUN AS 2013-07-03 CN claimed
JP-5186739-A None JP disclosed
EP-3805327-B1 ANTIFOULING PAINT COMPOSITION MITSUBISHI CHEM CORP (JP) 2026-04-15 EP disclosed
EP-4112676-B1 METHOD FOR PRODUCING NITRILE RUBBER ZEON CORP (JP) 2026-02-18 EP disclosed
EP-3904430-B1 METHOD FOR RECYCLING NITRILE RUBBER ZEON CORP (JP) 2025-12-03 EP disclosed
US-12404350-B2 Method for producing nitrile rubber ZEON CORPORATION (JP) 2025-09-02 US disclosed
US-12351716-B2 Method for recycling nitrile rubber ZEON CORPORATION (JP) 2025-07-08 US disclosed
US-20250206924-A1 LATEX COMPOSITION AND DIP-MOLDED BODY ZEON CORPORATION (JP) 2025-06-26 US disclosed
US-12331197-B2 Power transmission belt DAYCO EUROPE S.R.L. (IT) 2025-06-17 US disclosed
CN-119937243-A Chemically amplified positive photosensitive resin composition, cured film, and element having cured film 奇美实业股份有限公司 2025-05-06 CN disclosed
EP-1326267-A1 ABRASIVE CLOTH, POLISHING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Kabushiki Kaisha Toshiba (JP) 2003-07-09 EP disclosed
CN-1397841-A Positive film type light sensitiveness anticorrosion additive compsn. and application thereof MITSUI CHEMICALS INC (JP) 2003-02-19 CN disclosed
US-6384146-B1 MIXING LIVING POLYMER WITH FIRST MONOMER UNDER CONDITIONS EFFECTIVE TO PRODUCE BLOCK COPOLYMER, MIXING BLOCK COPOLYMER WITH SECOND MONOMER UNDER CONDITIONS EFFECTIVE TO PRODUCE BLOCK-GRAFT OR STAR-SHAPED COPOLYMER THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK 2002-05-07 US disclosed
WO-2000059968-A9 GRAFT, GRAFT-BLOCK, BLOCK-GRAFT, AND STAR-SHAPED COPOLYMERS AND METHODS OF MAKING THEM UNIV NEW YORK STATE RES FOUND (US) 2002-02-21 WO disclosed
WO-2000059968-A1 GRAFT, GRAFT-BLOCK, BLOCK-GRAFT, AND STAR-SHAPED COPOLYMERS AND METHODS OF MAKING THEM THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2000-10-12 WO disclosed
JP-H05186739-A METHOD OF COATING WITH CURABLE RESIN COMPOSITION DAINIPPON INK & CHEM INC 1993-07-27 JP disclosed
US-5072029-A CATALYZED PROCESS FOR REACTING CARBOXYLIC ACIDS WITH VINYL ETHERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1991-12-10 US disclosed
CN-1055609-A The light activated element of available water processing DU PONT (US) 1991-10-23 CN disclosed
WO-1991015453-A1 CATALYZED PROCESS FOR REACTING CARBOXYLIC ACIDS WITH VINYL ETHERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-10-17 WO disclosed
EP-0451736-A2 Aqueous processable photosensitive element E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-10-16 EP disclosed