Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL6313567

CCC=C(C(=O)O)C(C)(C)C.N

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.35
GRIK2 Q13002 1/20 0.35
EP300 Q09472 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18803276 0.98 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL5138422 0.98 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL7560375 0.98 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL7558899 0.79 EP300 (0.42) GRIK1GRIK2EP300
SCHEMBL11232432 0.79 GRIK1 (0.34) GRIK1GRIK2
SCHEMBL7558903 0.79 EP300 (0.42) GRIK1GRIK2EP300
SCHEMBL9898997 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL7174689 0.78
SCHEMBL9899000 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL2852706 0.76 GRIK1 (0.35) GRIK1GRIK2EP300

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6887643-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-05-03 US disclosed
US-20040053156-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-03-18 US disclosed
EP-1388758-A1 Photosensitive heat resistant resin precursor composition TORAY INDUSTRIES, INC. (JP) 2004-02-11 EP disclosed