SCHEMBL2852706

SCHEMBL2852706

CCC=C(C(=O)O)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 1/20 0.35
GRIK2 Q13002 1/20 0.35
CYP2C19 P33261 1/20 0.33
FAAH O00519 8/20 0.32
CES1 P23141 5/20 0.31
CES2 O00748 2/20 0.31
MEN1 O00255 1/20 0.31
CYP1A2 P05177 1/20 0.31
KMT2A Q03164 1/20 0.31
HSD17B10 Q99714 1/20 0.31
EP300 Q09472 1/20 0.30
GABRR1 P24046 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2852703 1.00 GRIK1 (0.35) GRIK1GRIK2CYP2C19FAAHCES1
SCHEMBL28251374 0.81
SCHEMBL19909694 0.79 FAAH (0.31) GRIK1GRIK2FAAHCES1CES2
SCHEMBL6545549 0.79 EP300 (0.52) GRIK1FAAHCES1CES2MEN1
SCHEMBL18803276 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL9899000 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL7560375 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL5138422 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL9898997 0.78 GRIK1 (0.36) GRIK1GRIK2EP300
SCHEMBL29684709 0.77 MEN1 (0.30) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116964228-A Composition and method for waterproofing leather 斯塔尔国际有限公司 2023-10-27 CN disclosed
EP-2142503-A2 PROCESS FOR THE MANUFACTURE FOR NON-STEROIDAL ANTI-INFLAMMATORY AGENTS AND INTERMEDIATES THEREOF Intendis GmbH (DE) 2010-01-13 EP disclosed
WO-2008128750-A2 PROCESS FOR THE MANUFACTURE FOR NON-STEROIDAL ANTI-INFLAMMATORY AGENTS AND INTERMEDIATES THEREOF INTENDIS GMBH (DE) 2008-10-30 WO disclosed
US-6835524-B2 Polymers, chemical amplification resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-12-28 US disclosed
US-20010018162-A1 Novel polymers, chemical amplification resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-08-30 US disclosed