Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.34 |
| ▸ | AR | P10275 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9016041 | 0.82 | CYP3A4 (0.48) | SMN1; SMN2CYP3A4TSHRPIK3CA | |
| SCHEMBL6666165 | 0.79 | SMN1; SMN2 (0.40) | SMN1; SMN2CYP3A4TSHRPIK3CAAR | |
| SCHEMBL5958702 | 0.79 | SMN1; SMN2 (0.40) | SMN1; SMN2CYP3A4TSHRPIK3CAAR | |
| SCHEMBL15957894 | 0.76 | SMN1; SMN2 (0.59) | SMN1; SMN2CYP3A4TSHRPIK3CAAR | |
| SCHEMBL6313609 | 0.74 | POLB (0.34) | SMN1; SMN2 | |
| SCHEMBL15957685 | 0.74 | AR (0.57) | SMN1; SMN2CYP3A4TSHRPIK3CAAR | |
| SCHEMBL6312718 | 0.72 | SMN1; SMN2 (0.32) | SMN1; SMN2 | |
| SCHEMBL2923418 | 0.72 | CYP3A4 (0.42) | SMN1; SMN2CYP3A4TSHRPIK3CA | |
| SCHEMBL13199119 | 0.71 | SMN1; SMN2 (0.37) | SMN1; SMN2CYP3A4TSHRPIK3CAAR | |
| SCHEMBL9770161 | 0.69 | TRPA1 (0.41) | SMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112939915-A | Diamine monomer for photosensitive resin, polyimide precursor, photosensitive resin composition, and use thereof | 武汉柔显科技股份有限公司 | 2021-06-11 | — | — | CN | disclosed |
| EP-1296540-B1 | DISPLAY | TORAY INDUSTRIES (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-6887643-B2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-05-03 | — | — | US | disclosed |
| EP-0878740-B1 | Radiation sensitive polymer composition | TORAY INDUSTRIES (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040053156-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-03-18 | — | — | US | disclosed |
| US-6696112-B2 | POSITIVE-TYPE, PHOTOSENSITIVITY; FLAT PANEL DISPLAYS | TORAY INDUSTRIES, INC. (JP) | 2004-02-24 | — | — | US | disclosed |
| EP-1388758-A1 | Photosensitive heat resistant resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-02-11 | — | — | EP | disclosed |
| EP-1296540-A1 | DISPLAY | TORAY INDUSTRIES, INC. (JP) | 2003-03-26 | — | — | EP | disclosed |
| US-20020162998-A1 | Display | TORAY INDUSTRIES, INC. (JP) | 2002-11-07 | — | — | US | disclosed |
| US-6090525-A | PHOTOSENSITIVE POLYIMIDE COATING AGENT COMPOSITION WITH BOTH GOOD VISCOSITY STABILITY AT ROOM TEMPERATURE WITH LAPSE OF TIME AND GOOD PHOTOSENSITIVE PERFORMANCE | TORAY INDUSTRIES, INC. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0878740-A1 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1998-11-18 | — | — | EP | disclosed |