Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.64 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | MGLL | Q99685 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL8164846 | 0.91 | ALDH1A1 (0.54) | ALDH1A1TP53CYP3A4MGLL | |
| SCHEMBL631946 | 0.90 | ALDH1A1 (0.60) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL4865011 | 0.89 | ALDH1A1 (0.58) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL607207 | 0.87 | ALDH1A1 (0.57) | ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL9441611 | 0.87 | ALDH1A1 (0.57) | ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL866090 | 0.87 | ALDH1A1 (0.57) | ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL156678 | 0.86 | ALDH1A1 (0.68) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| Butane SCHEMBL21196517 | 0.84 | ALDH1A1 (0.89) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| Ethylene SCHEMBL28874023 | 0.84 | ALDH1A1 (0.66) | ALDH1A1TP53CYP3A4SMN1; SMN2TDP1 | |
| SCHEMBL8054764 | 0.84 | ALDH1A1 (0.61) | ALDH1A1TP53CYP3A4MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 529 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | claimed |
| EP-4010382-B1 | POLYMER LATEX COMPOSITION FOR THE PREPARATION OF AN ELASTOMERIC FILM HAVING SELF-HEALING PROPERTIES | SYNTHOMER SDN BHD (MY) | 2024-03-20 | — | — | EP | claimed |
| CN-117089014-B | Acrylate copolymer, adhesive and protective film | 江苏皇冠新材料科技有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-113169335-B | Electrode composition for cathode of battery cell of lithium ion battery, cathode slurry composition containing same, cathode and battery | 阿朗新科德国有限责任公司 | 2023-10-13 | — | — | CN | claimed |
| EP-3900086-B1 | ELECTRODE COMPOSITION FOR A CATHODE OF A CELL OF A LITHIUM-ION BATTERY, A CATHODE SLURRY COMPOSITION, A CATHODE AND THE BATTERY INCORPORATING IT | ARLANXEO DEUTSCHLAND GMBH (DE) | 2023-01-11 | — | — | EP | claimed |
| CN-114773914-A | Pigment dispersion liquid and preparation method and application thereof | 苏州世名科技股份有限公司 | 2022-07-22 | — | — | CN | claimed |
| US-20220227954-A1 | POLYMERIC SURFACE HAVING REDUCED BIOMOLECULE ADHESION TO THERMOPLASTIC ARTICLES OF SUCH SUBSTRATE | OAKTREE FUND ADMINISTRATION, LLC | 2022-07-21 | — | — | US | claimed |
| EP-4010382-A1 | POLYMER LATEX COMPOSITION FOR THE PREPARATION OF AN ELASTOMERIC FILM HAVING SELF-HEALING PROPERTIES | Synthomer Sdn. Bhd. (MY) | 2022-06-15 | — | — | EP | claimed |
| CN-114555680-A | Method for producing elastomeric films | 昕特玛私人有限公司 | 2022-05-27 | — | — | CN | claimed |
| CN-114206950-A | Polymer latex composition for preparing elastomer film with self-repairing property | 昕特玛私人有限公司 | 2022-03-18 | — | — | CN | claimed |
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | claimed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-20060275700-A1 | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-12-07 | — | — | US | claimed |
| CN-1873534-A | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-12-06 | — | — | CN | claimed |
| US-7101650-B2 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-09-05 | — | — | US | claimed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| WO-2003017001-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-02-27 | — | — | WO | claimed |
| US-4497721-A | MINERAL OR SYNTHETIC OIL, 15-CROWN-5 OR 15-CROWN-5 DERIVATIVES AND GLYCIDYL COMPOUND | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1985-02-05 | — | — | US | claimed |