Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.58 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.58 |
| ▸ | PARP1 | P09874 | 2/20 | 0.58 |
| ▸ | POLB | P06746 | 1/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.58 |
| ▸ | MAPT | P10636 | 1/20 | 0.58 |
| ▸ | RECQL | P46063 | 1/20 | 0.58 |
| ▸ | BLM | P54132 | 1/20 | 0.58 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.58 |
| ▸ | CES2 | O00748 | 4/20 | 0.48 |
| ▸ | CES1 | P23141 | 4/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | F2 | P00734 | 2/20 | 0.44 |
| ▸ | DAO | P14920 | 1/20 | 0.44 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL631411 | 1.00 | TSHR (0.58) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL4744670 | 0.84 | TSHR (0.54) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL4744665 | 0.84 | TSHR (0.54) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL11150329 | 0.82 | TSHR (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL11150318 | 0.82 | TSHR (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL2915519 | 0.82 | TSHR (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL1562541 | 0.81 | CES1 (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL1562534 | 0.81 | CES1 (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL5072437 | 0.81 | CES1 (0.52) | TSHRCYP2C19PARP1POLBCYP3A4 | |
| SCHEMBL26663883 | 0.81 | CES1 (0.58) | TSHRCYP2C19PARP1POLBCYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1532566-B | Radiation sensitive composition for color filter | JSR CORP | 2010-05-12 | — | — | CN | claimed |
| CN-110537146-A | Photosensitive resin composition | NISSAN CHEMICAL CORP | 2019-12-03 | — | — | CN | disclosed |
| CN-110537147-A | Photosensitive polymer combination | NISSAN CHEMICAL IND LTD | 2019-12-03 | — | — | CN | disclosed |
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| US-9829796-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| CN-107003607-A | Positive type photosensitive organic compound | 日产化学工业株式会社 | 2017-08-01 | — | — | CN | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20160147154-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160147155-A1 | PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD FOR ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-5866294-A | HIGH DURABLE PRINTING | TORAY INDUSTRIES, INC. (JP) | 1999-02-02 | — | — | US | disclosed |
| EP-0633500-B1 | Photosensitive composition and process for image formation | FUJI PHOTO FILM CO LTD (JP) | 1998-11-11 | — | — | EP | disclosed |
| EP-0678785-A1 | DRY LITHOGRAPHIC FORME | TORAY INDUSTRIES, INC. (JP) | 1995-10-25 | — | — | EP | disclosed |
| EP-0291537-B1 | COLORED IMAGE-FORMING MATERIAL AND PROCESS FOR FORMING COLORED IMAGE | MITSUBISHI KASEI CORPORATION (JP) | 1993-09-08 | — | — | EP | disclosed |
| EP-0421381-A2 | A method for transferring images and an apparatus used therefor | KONICA CORPORATION (JP) | 1991-04-10 | — | — | EP | disclosed |
| EP-0397375-A1 | Photosensitive composition and photosensitive lithographic printing plate | KONICA CORPORATION (JP) | 1990-11-14 | — | — | EP | disclosed |
| EP-0353873-A1 | Photsensitive composition | KONICA CORPORATION (JP) | 1990-02-07 | — | — | EP | disclosed |
| EP-0291537-A1 | COLORED IMAGE-FORMING MATERIAL AND PROCESS FOR FORMING COLORED IMAGE | MITSUBISHI KASEI CORPORATION (JP) | 1988-11-23 | — | — | EP | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |