SCHEMBL631692

SCHEMBL631692

C=C[Si](CCl)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL931247 0.77
SCHEMBL930678 0.77
SCHEMBL143500 0.74
SCHEMBL1263464 0.74
SCHEMBL930736 0.72
SCHEMBL1263433 0.72
SCHEMBL4081159 0.72
SCHEMBL15015607 0.72
SCHEMBL10298089 0.72
SCHEMBL1493203 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3861039-B1 HYDROGEL COMPOSITIONS OPHTALMIC CIE (FR) 2023-11-01 EP claimed
US-20210332174-A1 HYDROGEL COMPOSITIONS OPHTALMIC COMPAGNIE (FR) 2021-10-28 US claimed
EP-3861039-A1 HYDROGEL COMPOSITIONS Ophtalmic Compagnie (FR) 2021-08-11 EP claimed
WO-2020070423-A1 HYDROGEL COMPOSITIONS OPHTALMIC COMPAGNIE (FR) 2020-04-09 WO claimed
US-20250326936-A1 ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM MAXTERIAL INC (US) 2025-10-23 US disclosed
US-20250319238-A1 COATING COMPOSITION FOR MEDICAL IMPLANTS TO PREVENT FOREIGN SUBSTANCE ADHESION LYNK SOLUTEC INC. (KR) 2025-10-16 US disclosed
US-20250288731-A1 COATING COMPOSITION FOR PROTECTION OF ENDOSCOPE LYNK SOLUTEC INC (KR) 2025-09-18 US disclosed
US-12173166-B2 Articles including surface coatings and methods to produce them MAXTERIAL, INC. (US) 2024-12-24 US disclosed
EP-3861039-B1 HYDROGEL COMPOSITIONS OPHTALMIC CIE (FR) 2023-11-01 EP disclosed
US-20230295827-A1 COATINGS AND COATED SURFACES INCLUDING LOW-SURFACE ENERGY INORGANIC PARTICLES MAXTERIAL INC (US) 2023-09-21 US disclosed
US-11542621-B1 Coatings and coated surfaces including low-surface energy inorganic particles MAXTERIAL, INC. (US) 2023-01-03 US disclosed
EP-4106913-A1 COMPOSITIONS, METHODS AND SYSTEMS FOR SAMPLE PROCESSING 10X Genomics, Inc. (US) 2022-12-28 EP disclosed
US-20080038527-A1 Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation JSR CORPORATION (JP) 2008-02-14 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
EP-1746122-A1 METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION JSR Corporation (JP) 2007-01-24 EP disclosed
EP-1746123-A1 METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION JSR Corporation (JP) 2007-01-24 EP disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
US-4863557-A Pattern forming process and thin-film magnetic head formed by said process KOKAKU YUUICHI (JP) 1989-09-05 US disclosed