Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 2/20 | 0.50 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.44 |
| ▸ | HTT | P42858 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2090330 | 0.98 | NAAA (0.51) | NAAAEPHX1HTTALDH1A1CYP2C19 | |
| SCHEMBL29117582 | 0.98 | NAAA (0.51) | NAAAEPHX1HTTALDH1A1CYP2C19 | |
| SCHEMBL28473788 | 0.88 | NAAA (0.63) | NAAAEPHX1HTTALDH1A1SMN1; SMN2 | |
| SCHEMBL9009690 | 0.88 | NAAA (0.57) | NAAAEPHX1HTTALDH1A1CYP2C19 | |
| SCHEMBL29117609 | 0.88 | NAAA (0.57) | NAAAEPHX1HTTALDH1A1CYP2C19 | |
| SCHEMBL5075294 | 0.86 | NAAA (0.64) | NAAAEPHX1HTTALDH1A1 | |
| SCHEMBL27724658 | 0.86 | NAAA (0.44) | NAAAEPHX1HTTALDH1A1CYP2C19 | |
| SCHEMBL27626124 | 0.85 | NAAA (0.67) | NAAAEPHX1HTTALDH1A1 | |
| SCHEMBL6433418 | 0.85 | NAAA (0.67) | NAAAEPHX1HTTALDH1A1 | |
| SCHEMBL9468402 | 0.85 | NAAA (0.67) | NAAAEPHX1HTTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| CN-108003972-B | Lubricating oil composition for diesel engine and preparation method thereof | 中国石油化工股份有限公司 | 2020-10-27 | — | — | CN | disclosed |
| WO-2020138184-A1 | CARBOXYL GROUP-CONTAINING NITRILE RUBBER | 日本ゼオン株式会社 | 2020-07-02 | — | — | WO | disclosed |
| WO-2020138183-A1 | METHOD FOR RECYCLING NITRILE RUBBER | 日本ゼオン株式会社 | 2020-07-02 | — | — | WO | disclosed |
| EP-1720072-B1 | Compositons and processes for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2019-06-05 | — | — | EP | disclosed |
| US-10222699-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-05 | — | — | US | disclosed |
| US-9696622-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-9563128-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-02-07 | — | — | US | disclosed |
| US-9437431-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| EP-1918778-B1 | Compositions and processes for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2016-08-03 | — | — | EP | disclosed |
| US-7968268-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-06-28 | — | — | US | disclosed |
| US-20090130592-A1 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-05-21 | — | — | US | disclosed |
| US-20090123869-A1 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-05-14 | — | — | US | disclosed |
| US-20090117489-A1 | Compositons and processes for immersion lithography | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2009-05-07 | — | — | US | disclosed |
| EP-2056162-A1 | Compositions and processes for immersion lithography | Rohm and Haas Electronic Materials LLC (US) | 2009-05-06 | — | — | EP | disclosed |
| US-20080292990-A1 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-11-27 | — | — | US | disclosed |
| EP-1959479-A2 | Electronic device manufacture | Rohm and Haas Electronic Materials LLC (US) | 2008-08-20 | — | — | EP | disclosed |
| US-20080193872-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-14 | — | — | US | disclosed |
| EP-1918778-A2 | Compositions and processes for immersion lithography | Rohm and Haas Electronic Materials LLC (US) | 2008-05-07 | — | — | EP | disclosed |
| US-20060246373-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-02 | — | — | US | disclosed |