⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8691932 | 0.77 | DAO (0.35) | — | |
| SCHEMBL6567013 | 0.77 | DAO (0.35) | — | |
| SCHEMBL30640511 | 0.72 | — | — | |
| SCHEMBL5188834 | 0.72 | — | — | |
| SCHEMBL3489515 | 0.72 | — | — | |
| SCHEMBL11820016 | 0.72 | — | — | |
| SCHEMBL1862371 | 0.72 | — | — | |
| SCHEMBL3299719 | 0.72 | — | — | |
| SCHEMBL6209082 | 0.72 | — | — | |
| SCHEMBL10992433 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4279634-A1 | METHOD FOR NANO ETCHING OF COPPER AND COPPER ALLOY SURFACES | Atotech Deutschland GmbH & Co. KG (DE) | 2023-11-22 | — | — | EP | disclosed |
| CN-104448700-A | Resin composition | AJINOMOTO KK | 2015-03-25 | — | — | CN | disclosed |
| US-6949670-B2 | Fluorocompound, silver halide photographic light-sensitive material, surfactant, and water-based coating composition employing same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20040044244-A1 | Fluorocompound, silver halide photographic light-sensitive material, surfactant, and water-based coating composition empolying same | FUJI PHOTO FILM CO. LTD. | 2004-03-04 | — | — | US | disclosed |
| US-6589723-B2 | Fluoroalkyl sulfosuccinates | FUJI FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-20020197571-A1 | Fluorocompound, silver halide photographic light-sensitive material, surfactant, and water-based coating composition employing same | FUJIFILM CORPORATION (JP) | 2002-12-26 | — | — | US | disclosed |
| EP-0423251-A4 | ASSAY FOR QUALITATIVE AND QUANTITATIVE DETECTION OF ORGANIC AND INORGANIC ANALYTES OF DIVERSE CHEMICAL CLASSES VIA THE SELECTIVE FORMATION AND GROWTH OF LIGHT SCATTERING CRYSTALS | — | 1993-06-09 | — | — | EP | disclosed |
| EP-0423251-A1 | ASSAY FOR QUALITATIVE AND QUANTITATIVE DETECTION OF ORGANIC AND INORGANIC ANALYTES OF DIVERSE CHEMICAL CLASSES VIA THE SELECTIVE FORMATION AND GROWTH OF LIGHT SCATTERING CRYSTALS | CRYSTAL DIAGNOSTICS, INC. (US) | 1991-04-24 | — | — | EP | disclosed |
| US-4952513-A | NOT FOR KETONES AND ALDEHYDES; FORMING REACTION PRODUCT IN SITU WITH DERIVATIZING AGENT | CRYSTAL DIAGNOSTICS, INC. (US) | 1990-08-28 | — | — | US | disclosed |
| WO-1990004781-A1 | ASSAY FOR QUALITATIVE AND QUANTITATIVE DETECTION OF ORGANIC AND INORGANIC ANALYTES OF DIVERSE CHEMICAL CLASSES VIA THE SELECTIVE FORMATION AND GROWTH OF LIGHT SCATTERING CRYSTALS | CRYSTAL DIAGNOSTICS, INC. (US) | 1990-05-03 | — | — | WO | disclosed |