Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27659775 | 0.85 | — | — | |
| SCHEMBL749805 | 0.78 | THRB (0.35) | THRBLMNA | |
| Ammonia Solution, Strong SCHEMBL4366931 | 0.76 | THRB (0.33) | THRBLMNA | |
| SCHEMBL319331 | 0.75 | — | — | |
| SCHEMBL9487660 | 0.75 | THRB (0.36) | THRBLMNA | |
| SCHEMBL7682477 | 0.75 | MAPK1 (0.33) | — | |
| SCHEMBL7100639 | 0.75 | MAPK1 (0.33) | — | |
| SCHEMBL9700080 | 0.74 | THRB (0.32) | THRBLMNA | |
| SCHEMBL15577388 | 0.73 | THRB (0.35) | THRBLMNA | |
| SCHEMBL6250058 | 0.73 | THRB (0.35) | THRBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111123649-B | Negative photoresist composition containing high heat resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2024-01-30 | — | — | CN | claimed |
| CN-116589622-A | High-temperature-resistant photoresist film-forming resin and preparation method and application thereof | 北京化工大学 | 2023-08-15 | — | — | CN | claimed |
| CN-113999340-B | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-04-28 | — | — | CN | claimed |
| CN-118778361-B | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-12-20 | — | — | CN | disclosed |
| CN-118778361-A | Water-soluble acrylic photoresist | 广东科优材料科技有限公司 | 2024-10-15 | — | — | CN | disclosed |
| CN-117908329-A | KrF positive photoresist and preparation method thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-111123649-B | Negative photoresist composition containing high heat resistance carboxyl phenolic resin | 苏州瑞红电子化学品有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-113717314-B | Photosensitive film-forming resin, photoresist composition and preparation method thereof | 江苏集萃光敏电子材料研究所有限公司 | 2023-09-22 | — | — | CN | disclosed |
| CN-116589622-A | High-temperature-resistant photoresist film-forming resin and preparation method and application thereof | 北京化工大学 | 2023-08-15 | — | — | CN | disclosed |
| CN-113999340-B | Film-forming resin containing silicon or sulfur and photoresist composition | 江苏集萃光敏电子材料研究所有限公司 | 2023-04-28 | — | — | CN | disclosed |
| US-9083044-B2 | Method for manufacturing anode active material for lithium secondary battery, anode active material for lithium secondary battery manufactured thereby and lithium secondary battery using same | ECOPRO CO., LTD. (KR) | 2015-07-14 | — | — | US | disclosed |
| US-20130183583-A1 | METHOD FOR MANUFACTURING ANODE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERY, ANODE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERY MANUFACTURED THEREBY AND LITHIUM SECONDARY BATTERY USING SAME | ECOPRO CO LTD (KR) | 2013-07-18 | — | — | US | disclosed |
| CN-101146840-B | Perfluoropolyether urethane additives having (meth)acryl groups and hardcoats | 3M INNOVATIVE PROPERTIES CO | 2011-06-15 | — | — | CN | disclosed |
| CN-101146840-A | Perfluoropolyether urethane additives having (meth)acryl groups and hardcoats | 3M INNOVATIVE PROPERTIES CO (US) | 2008-03-19 | — | — | CN | disclosed |
| US-20050233207-A1 | Electrolyte for lithium ion battery to control swelling | E SQUARE TECHNOLOGIES CO, LTD. (KR) | 2005-10-20 | — | — | US | disclosed |
| US-6856777-B2 | Image forming apparatus with first and second charging members for charging residual toner | CANON KABUSHIKI KAISHA (JP) | 2005-02-15 | — | — | US | disclosed |
| US-20030053820-A1 | Image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2003-03-20 | — | — | US | disclosed |
| EP-0009679-B1 | FLUORESCENT DYESTUFFS OF THE STILBENE SERIES, PROCESS FOR THEIR PREPARATION AND THEIR USE IN THE WHITENING OF ORGANIC MATERIALS AND AS LASER DYESTUFFS | BAYER AG (DE) | 1982-04-21 | — | — | EP | disclosed |
| EP-0042181-A2 | Diphenyl derivatives | BAYER AG (DE) | 1981-12-23 | — | — | EP | disclosed |